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US 12,625,433 B2Granted
Spatial light modulation unit and exposure apparatus
AssigneeNikon Corporation
InventorsYasuhito Kubota, Yasushi Mizuno, Masaki Kato, Masaki Nishimura, Hitoshi Mizuno
Life of this patent
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Abstract
A spatial light modulation unit is used in an exposure apparatus that exposes an exposure pattern onto a photosensitive substrate while moving the photosensitive substrate in a scan direction. The spatial light modulation unit includes: a spatial light modulator having a plurality of elements; a controller that controls the plurality of elements in accordance with the exposure pattern; and a SLM substrate on which the spatial light modulator and the controller are provided. The controller is arranged side by side in the scan direction with respect to the spatial light modulator.
Claims26
An exposure apparatus that exposes an exposure pattern onto a photosensitive substrate while moving the photosensitive substrate in a scan direction, the exposure apparatus comprising:
- a first spatial light modulation unit including:
- a first spatial light modulator including a plurality of first elements controlled in accordance with the exposure pattern;
- and
- one of a first electric source circuit and a first controller that controls the plurality of first elements;
- a first projection optical system that irradiates the photosensitive substrate with light from the first spatial light modulator;
- a second spatial light modulation unit including:
- a second spatial light modulator including a plurality of second elements controlled in accordance with the exposure pattern;
- and
- one of a second electric source circuit and a second controller that controls the plurality of second elements;
- a second projection optical system that irradiates the photosensitive substrate with light from the second spatial light modulator;
- a first illumination optical system including:
- a first lens that guides incident light downward;
- and
- a first mirror that guides light passed through the first lens to the plurality of first elements;
- and
- a second illumination optical system including:
- a second lens that guides incident light downward;
- and
- a second mirror that guides light passed through the second lens to the plurality of second elements, wherein
- the first lens of the first illumination optical system is located at a position lower than the first spatial light modulator,
- the second lens of the second illumination optical system is located at a position lower than the second spatial light modulator,
- in a plan view,
- the first lens of the first illumination optical system and the first spatial light modulator are arranged in the scan direction without overlapping each other,
- the second lens of the second illumination optical system and the second spatial light modulator are arranged in the scan direction without overlapping each other,
- the first projection optical system and the second projection optical system are arranged in a first direction that crosses the scan direction, and
- the first spatial light modulator and the one of the first electric source circuit and the first controller are arranged in the scan direction or in a second direction closer to the scan direction than the first direction.
23 more elements
A spatial light modulation unit used in an exposure apparatus that exposes an exposure pattern onto a photosensitive substrate while moving the photosensitive substrate in a scan direction, the spatial light modulation unit comprising:
- a spatial light modulator including a plurality of elements;
- a controller that controls the plurality of elements in accordance with the exposure pattern;
- a supply portion that supplies electric power to the spatial light modulator and the controller;
- and
- a SLM substrate on which the spatial light modulator and the controller are provided,
- wherein the SLM substrate includes:
- a first substrate on which the spatial light modulator is provided and to which a part of the supply portion is connected;
- and
- a second substrate on which the controller is provided and to which another part of the supply portion is connected, and
- wherein a second plane of the second substrate on which the controller is provided crosses a first plane of the first substrate on which the spatial light modulator is provided.
7 more elements
An exposure apparatus that exposes an exposure pattern onto a photosensitive substrate while moving the photosensitive substrate in a scan direction, the exposure apparatus comprising:
- a spatial light modulator including a plurality of elements;
- a controller that controls the plurality of elements in accordance with the exposure pattern;
- a SLM substrate on which the spatial light modulator and the controller are provided;
- a heat sink that cools the controller,
- an illumination optical system including:
- a lens that guides incident light downward;
- and
- a mirror that guides light passed through the lens to the plurality of elements, wherein
- the lens of the illumination optical system is located at a position lower than the spatial light modulator,
- in a plan view, the lens of the illumination optical system and the spatial light modulator are arranged in the scan direction without overlapping each other,
- light from the spatial light modulator is emitted from a front side of the SLM substrate, and
- the controller is provided on a rear side of the SLM substrate.
9 more elements
An exposure apparatus comprising:
- a first substrate on which are provided:
- a first spatial light modulator including a plurality of first elements, and;
- a controller that controls the plurality of first elements;
- a stage including a top surface configured to hold an object, the stage is located below the first spatial light modulator and is movable in a first direction and a second direction intersecting the first direction relative to the first spatial light modulator;
- and
- a first illumination optical system including:
- a first lens that guides incident light downward;
- and
- a first mirror that guides light passed through the first lens to the plurality of first elements, wherein
- the first lens of the first illumination optical system is located at a position lower than the first spatial light modulator,
- in a plan view, the first lens of the first illumination optical system and the first spatial light modulator are arranged in the first direction without overlapping each other, and
- in the plan view, the controller and the first spatial light modulator are arranged in the first direction or in a direction closer to the first direction than the second direction.
9 more elements
An exposure apparatus comprising:
- a first substrate on which a first spatial light modulator including a plurality of first elements is provided;
- a first illumination optical system including:
- a fly eye lens;
- a first lens that guides light passed through the fly eye lens downward;
- and
- a first mirror that guides light passed through the first lens to the plurality of first elements;
- and
- a stage including a top surface configured to hold an object, the stage is located below the first spatial light modulator and is movable in a first direction and a second direction intersecting the first direction relative to the first spatial light modulator, wherein
- the first lens of the first illumination optical system is located at a position lower than the first spatial light modulator, and
- in a plan view, the first lens of the first illumination optical system and the first spatial light modulator are arranged in the first direction without overlapping each other.
7 more elements
An exposure apparatus comprising:
- a first substrate on which a first spatial light modulator including a plurality of first elements is provided;
- a second substrate on which a second spatial light modulator including a plurality of second elements is provided;
- a stage including a top surface configured to hold an object, the stage is located below the first spatial light modulator and the second spatial light modulator and is movable in a first direction and a second direction intersecting the first direction relative to the first spatial light modulator and the second spatial light modulator;
- a first illumination optical system including:
- a first lens that guides incident light downward;
- and
- a first mirror that guides light passed through the first lens to the plurality of first elements;
- and
- a second illumination optical system including:
- a second lens that guides incident light downward;
- and
- a second mirror that guides light passed through the second lens to the plurality of second elements, wherein
- the first spatial light modulator and the second spatial light modulator are arranged in the second direction,
- the first lens of the first illumination optical system is located at a position lower than the first spatial light modulator,
- the second lens of the second illumination optical system is located at a position lower than the second spatial light modulator,
- in a plan view, the first lens of the first illumination optical system and the first spatial light modulator are arranged in the first direction without overlapping each other,
- in the plan view, the second lens of the second illumination optical system and the second spatial light modulator are arranged in the first direction without overlapping each other,
- a longitudinal direction of the first substrate extends in the first direction or in a direction closer to the first direction than the second direction, and
- a longitudinal direction of the second substrate extends in the first direction or in a direction closer to the first direction than the second direction.
16 more elements
Dependencies are inferred from the claim text.