Edge placement with spatial light modulator writing
AssigneeMycronic AB
InventorsMartin Glimtoft, Jan Sterner, Robert Eklund, Fredric Ihren, Pontus Stenstrom
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AssigneeMycronic AB
InventorsMartin Glimtoft, Jan Sterner, Robert Eklund, Fredric Ihren, Pontus Stenstrom
Estimating the term…
A method for preparing pixel data for writing with SLM comprises obtaining (S10) of data representing a pattern. The data is rasterized (S20) to a grid of pixels. The rasterizing comprises assigning (S22) of an edge adjustment value to pixels covering an edge of the pattern. The rasterized pattern is divided (S30) into a number of rasterized pattern planes associated with a respective radiant exposure. The sum of radiant exposures for a completely covered pixel exceeds (S32) a threshold for activating a radiation sensitive layer on a substrate, onto which the pattern is to be printed. The sum of radiant exposures for a pattern edge pixel corresponds (S34) to a quantity sufficient to move a position of where the sum of radiant exposures reaches the activation threshold a distance that corresponds to the edge adjustment value. Data representing the rasterized pattern planes are outputted (S40).
A method for preparing pixel data for writing with a spatial light modulator, the method comprising:
A rasterization module for preparing pixel data for writing with a spatial light modulator, the rasterization module comprising:
Dependencies are inferred from the claim text.