G03F 7/703
Non-planar pattern areas or non-planar masks
Official title: {Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates}
G03F7/703 (Non-planar pattern areas or non-planar masks) appears on 125 US grants and 117 published applications in this corpus.
Search patents in G03F- Granted patents
- 125
- Published applications
- 117
- Assignees
- 69
- Inventors
- 309
- Latest grant
- 27 May 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 4 | 0 |
| 1996 | 1 | 0 |
| 1997 | 4 | 0 |
| 1998 | 2 | 0 |
| 1999 | 0 | 0 |
| 2000 | 5 | 0 |
| 2001 | 4 | 1 |
| 2002 | 3 | 2 |
| 2003 | 5 | 9 |
| 2004 | 6 | 5 |
| 2005 | 3 | 7 |
| 2006 | 5 | 9 |
| 2007 | 1 | 5 |
| 2008 | 7 | 7 |
| 2009 | 6 | 8 |
| 2010 | 4 | 5 |
| 2011 | 3 | 6 |
| 2012 | 4 | 9 |
| 2013 | 7 | 9 |
| 2014 | 9 | 5 |
| 2015 | 5 | 4 |
| 2016 | 7 | 5 |
| 2017 | 5 | 1 |
| 2018 | 3 | 3 |
| 2019 | 1 | 2 |
| 2020 | 3 | 6 |
| 2021 | 5 | 3 |
| 2022 | 1 | 2 |
| 2023 | 3 | 0 |
| 2024 | 1 | 2 |
| 2025 | 1 | 0 |
| 2026 | 0 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Film formation device, film formation method, and article manufacturing method27 May 2025US 12,313,977 B2Canon Kabushiki Kaisha
- Optical objective for operation in EUV spectral region19 Mar 2024US 11,934,105 B2Nikon Corporation
- Secondary imaging optical lithography method and apparatus4 Jul 2023US 11,693,320 B2The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Photomask, exposure apparatus, and method of fabricating three-dimensional semiconductor memory device using the same30 May 2023US 11,662,659 B2Samsung Electronics Co., Ltd.
- Method and device for lithographically producing a target structure on a non-planar initial structure18 Apr 2023US 11,630,394 B2Karlsruhe Institute of Technology
- Maskless exposure system having image processing function for substrate positioning14 May 2026US 2026/0133503 A1SDA Co., Ltd.
- Exposure device / tool for circuits on curved surfaces and method for preparing curved circuits12 Feb 2026US 2026/0044084 A1University of Electronic Science and Technology of China
- Drawing apparatus and drawing method23 May 2024US 2024/0168386 A1SCREEN Holdings Co., Ltd.
- Semiconductor Featuring Ridged Architecture11 Jan 2024US 2024/0014262 A1
- Film formation device, film formation method, and article manufacturing method10 Nov 2022US 2022/0357667 A1Canon Kabushiki Kaisha
Most cited
By later US patents
- Methods and devices for fabricating three-dimensional nanoscale structures336US 7,704,684 B2The Board of Trustees of the University of Illinois · 2010
- Method and system for selective linewidth optimization during a lithographic process204US 6,509,952 B1Silicon Valley Group, Inc. · 2003
- Method and apparatus for producing integrated circuit devices89US 5,716,759 AShellcase Ltd. · 1998
- Exposure process and system84US 4,475,223 AHitachi, Ltd. · 1984
- Deformable wafer chuck69US 5,094,536 ALitel Instruments · 1992