Drawing apparatus and drawing method
AssigneeSCREEN Holdings Co., Ltd.
InventorShota MAJIMA
Life of this patent
Estimating the term…
Loading patent…
AssigneeSCREEN Holdings Co., Ltd.
InventorShota MAJIMA
Estimating the term…
A drawing pattern includes at least one stepped pattern that is drawn at least partially on an inclined surface of a stepped structure and extends in a longitudinal direction in a plan view, and the drawing apparatus includes: a modulator that has a diffraction grating including a plurality of diffractive elements arrayed in an array direction; a rotation mechanism that rotates a substrate in a horizontal plane; and a controller that controls the rotation mechanism to adjust an orientation of the substrate on the horizontal plane such that the longitudinal direction of the at least one stepped pattern substantially coincides with an orthogonal direction orthogonal to the array direction in the plan view.
A drawing apparatus that draws at least one drawing pattern on an exposure surface of a substrate, said exposure surface being provided with at least one stepped structure including a step upper surface, a step lower surface having a lower height than said step upper surface, and an inclined surface connecting said step upper surface and said step lower surface to each other, said at least one drawing pattern including at least one stepped pattern drawn at least partially on said inclined surface of said stepped structure, and said at least one stepped pattern extending in a longitudinal direction in a plan view, said drawing apparatus comprising:
A drawing method of drawing at least one drawing pattern on an exposure surface of a substrate, said exposure surface being provided with at least one stepped structure including a step upper surface, a step lower surface having a lower height than said step upper surface, and an inclined surface connecting said step upper surface and said step lower surface to each other, said at least one drawing pattern including at least one stepped pattern drawn at least partially on said inclined surface of said stepped structure, and said at least one stepped pattern extending in a longitudinal direction in a plan view, said drawing method comprising the steps of:
Dependencies are inferred from the claim text.