Maskless exposure system having image processing function for substrate positioning
AssigneeSDA Co., Ltd.
InventorsSang Bum SHIM, Chang Min IM, Young Soung MOON, Byeong Min LEE
Life of this patent
Estimating the term…
Abstract
A maskless exposure system having an image processing function for substrate positioning according to an embodiment is intended to provide precise position measurement and correction functions capable of detecting and correcting minute substrate alignment errors. Further, an objective of an embodiment is to provide a maskless exposure system having an image processing technology that automatically measures the substrate's roll, yaw, and pitch and reflects them in an exposure process.
Claims8
A maskless exposure system having an image processing function for substrate positioning, the maskless exposure system comprising:
- a management information processing device configured to receive and store image data to be exposed;
- a controller configured to receive the image data from the management information processing device and convert the image data into an output image;
- a stage on which a substrate to be exposed is mounted and configured to move in a direction opposite to an exposure direction and generate encoder signals while moving;
- an image capturing unit configured to capture an image of the substrate and transmit the image to the management information processing device;
- a trigger generator configured to receive the encoder signals from the stage, accumulate the number of pulses of the received encoder signals, and generate a trigger signal when the accumulated number of pulses corresponds to a position to be exposed;
- a DMD control unit configured to receive the output image from the controller and, generate a DMD control signal on the basis of the output image when receiving the trigger signal from the trigger generator;
- a light source configured to emit exposure light;
- a DMD configured to receive the DMD control signal from the DMD control unit and reflect the light from the light source by adjusting angles of specific micromirrors on the basis of the DMD control signal to expose a desired position on the substrate;
- and
- an optical system configured to refract the light reflected by the DMD to expose a desired position on the substrate to the light,
- wherein the management information processing device comprises:
- an image processing unit configured to calculate roll (rotation), yaw (later deviation), and pitch (longitudinal tilt) errors of the substrate on the basis of the image received from the image capturing unit;
- and
- an image correcting unit configured to generate a corrected image by correcting the image to be exposed on the basis of the roll (rotation), yaw (later deviation), and pitch (longitudinal tilt) errors of the substrate calculated by the image processing unit.
Dependencies are inferred from the claim text.