Exposure device / tool for circuits on curved surfaces and method for preparing curved circuits

Abstract

An exposure device or tool and a method for preparing circuits on curved surfaces, belonging to the technical field of exposure devices and tools, are disclosed. By expanding the designed pattern on the curved surface into multiple, continuous pattern blocks, the original curved pattern is converted into a flat pattern. Based on the flat pattern, a corresponding mask is designed, with the pattern areas retained. Subsequently, using the exposure device or tool, a photoresist on the curved surface is selectively exposed to light, thereby transferring the pattern from the mask to the curved surface. In this exposure process, rotation of the sample stage and horizontal movement of the mask, combined with the light from a light source, allow for the transfer of the pattern from the mask onto the curved sample or workpiece.

Dependencies are inferred from the claim text.