G03F 7/70325
Resolution enhancement techniques not otherwise provided for
Official title: {Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses}
G03F7/70325 (Resolution enhancement techniques not otherwise provided for) appears on 331 US grants and 312 published applications in this corpus.
Search patents in G03F- Granted patents
- 331
- Published applications
- 312
- Assignees
- 98
- Inventors
- 597
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 4 | 0 |
| 1991 | 2 | 0 |
| 1992 | 3 | 0 |
| 1993 | 3 | 0 |
| 1994 | 7 | 0 |
| 1995 | 5 | 0 |
| 1996 | 4 | 0 |
| 1997 | 10 | 0 |
| 1998 | 9 | 0 |
| 1999 | 5 | 0 |
| 2000 | 5 | 0 |
| 2001 | 14 | 2 |
| 2002 | 11 | 21 |
| 2003 | 15 | 13 |
| 2004 | 13 | 20 |
| 2005 | 10 | 16 |
| 2006 | 15 | 24 |
| 2007 | 7 | 21 |
| 2008 | 9 | 14 |
| 2009 | 12 | 15 |
| 2010 | 19 | 7 |
| 2011 | 11 | 11 |
| 2012 | 6 | 12 |
| 2013 | 12 | 13 |
| 2014 | 14 | 16 |
| 2015 | 13 | 13 |
| 2016 | 17 | 14 |
| 2017 | 14 | 12 |
| 2018 | 10 | 9 |
| 2019 | 10 | 8 |
| 2020 | 9 | 10 |
| 2021 | 9 | 6 |
| 2022 | 4 | 5 |
| 2023 | 5 | 5 |
| 2024 | 3 | 10 |
| 2025 | 3 | 6 |
| 2026 | 4 | 9 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Systems and methods for forming topological lattices of plasmonic merons16 Jun 2026US 12,656,689 B2The Trustees of Columbia University in the City of New York
- Method and system for nanoscale data recording26 May 2026US 12,638,779 B2
- Method of forming photoresist pattern, and photoresist structure21 Apr 2026US 12,607,935 B2Changxin Memory Technologies, Inc.
- Method for determining a position of a mirror6 Jan 2026US 12,516,963 B2Carl Zeiss SMT GmbH
- Exposure apparatus, exposure method, and manufacturing method for semiconductor device5 Aug 2025US 12,379,667 B2Canon Kabushiki Kaisha
- Liquid supply and discharge device, liquid supply and discharge method, immersion objective lens system, gene sequencer, and biochemical assay method27 Aug 2026US 2026/0251894 A1MGI Tech Co., Ltd.
- Surface plasmon lithography method20 Aug 2026US 2026/0244109 A1Institute of Microelectronics, Chinese Academy of Sciences
- Method for reducing the resolution of an aerial image of a photolithography mask without reducing a signal-to-noise ratio and corresponding optical system4 Jun 2026US 2026/0153807 A1
- Mirror system, method for operating a mirror system, projection lens for a microlithographic projection exposure system, and computer program product21 May 2026US 2026/0140456 A1
- Self-excitation lithography method with self-alignment effect30 Apr 2026US 2026/0118773 A1Institute of Microelectronics, Chinese Academy of Sciences
Most cited
By later US patents
- Lithography system employing a solid immersion lens588US 5,121,256 AThe Board of Trustees of the Leland Stanford Junior University · 1992
- Lithography patterning with a gas phase resist422US 10,018,920 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2018
- Method and apparatus for extending spatial frequencies in photolithography images288US 6,042,998 AUniversity of New Mexico · 2000
- Exposure method and projection exposure apparatus222US 5,194,893 ANikon Corporation · 1993
- Method and system for providing a microelectronic device using a plurality of focus distances149US 7,829,264 B1Western Digital (Fremont), LLC · 2010