Exposure apparatus, exposure method, and manufacturing method for semiconductor device

A manufacturing method for a semiconductor device, the method comprising:

• first formation of forming a groove in a substrate;
• and
• second formation of forming a pixel separation portion in the groove,
• wherein the first formation includes exposing the substrate to light using an exposure apparatus that includes an illumination optical system configured to illuminate an original in which a pattern is formed and an optical projection system that exhibits on-axis chromatic aberration and that is configured to form an image of the pattern at a plurality of positions in an optical axis direction of the optical projection system, and
• wherein the exposing includes exposing the substrate to light while scanning the substrate in a state where a normal direction of a surface of the substrate is inclined with respect to the optical axis direction of the optical projection system, using exposure light that includes first exposure light with a first wavelength and second exposure light with a second wavelength that is different from the first wavelength.

A manufacturing method for a product comprising:

• exposing a substrate to light using an exposure apparatus that includes an illumination optical system configured to illuminate an original in which a pattern is formed and an optical projection system that exhibits on-axis chromatic aberration and that is configured to form an image of the pattern at a plurality of positions in an optical axis direction of the optical projection system;
• performing development on the substrate that has been exposed to light;
• and
• processing the substrate on which the development has been performed to obtain a product,
• wherein the exposing includes exposing the substrate to light while scanning the substrate in a state where a normal direction of a surface of the substrate is inclined with respect to the optical axis direction of the optical projection system, using exposure light that includes first exposure light with a first wavelength and second exposure light with a second wavelength that is different from the first wavelength, and
• wherein parameters regarding both an angle of gradient of the substrate and a difference between the first wavelength and the second wavelength is adjusted so as to enable a change of a relative ratio between the angle of gradient and the difference.