G03F 7/70333
Focus drilling, i.e. increase in depth of focus for exposure by modulating
Official title: {Focus drilling, i.e. increase in depth of focus for exposure by modulating focus during exposure [FLEX]}
G03F7/70333 (Focus drilling, i.e. increase in depth of focus for exposure by modulating) appears on 168 US grants and 111 published applications in this corpus.
Search patents in G03F- Granted patents
- 168
- Published applications
- 111
- Assignees
- 40
- Inventors
- 281
- Latest grant
- 5 Aug 2025
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By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
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Most cited
By later US patents
- Exposure method and projection exposure apparatus222US 5,194,893 ANikon Corporation · 1993
- Method and system for providing a microelectronic device using a plurality of focus distances149US 7,829,264 B1Western Digital (Fremont), LLC · 2010
- Very narrow band, two chamber, high rep rate gas discharge laser system144US 6,567,450 B2Cymer, Inc. · 2003
- Very narrow band, two chamber, high rep rate gas discharge laser system136US 6,625,191 B2Cymer, Inc. · 2003
- Projection exposure apparatus111US 5,610,684 ANikon Corporation · 1997