Exposure apparatus, exposure method, and manufacturing method for product

An exposure apparatus that exposes a substrate to light by using an original in which a pattern is formed, the exposure apparatus comprising:

• an illumination optical system configured to illuminate the pattern with a first light of a first wavelength and an second light of a second wavelength different from the first wavelength light,
• a projection optical system configured to project a first pattern image with the first light and a second pattern image with the second light,
• a controller configured to adjust telecentricity of the illumination optical system so as to reduce a position difference in a direction perpendicular to an optical axis of the projection optical system between the first pattern image and the second pattern image.

An exposure method of exposing a substrate to light by using an original in which a pattern is formed, comprising the steps of:

• illuminating the original with illumination light including first illumination light with a first wavelength and second illumination light with a second wavelength different from the first wavelength;
• forming a pattern image of the original using a projection optical system by using the illumination light at a plurality of positions in an optical axis direction of the projection optical system;
• adjusting telecentricity of the illumination light based on an inclination amount of the pattern image due to a position deviation between a light condensing position of a light beam with the first wavelength which passed through the projection optical system and a light condensing position of a light beam with the second wavelength which passed through the projection optical system.