G03F 7/70358
Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
Official title: {Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging}
G03F7/70358 (Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging) appears on 1,163 US grants and 704 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,163
- Published applications
- 704
- Assignees
- 209
- Inventors
- 1,372
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 3 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 2 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 4 | 0 |
| 1984 | 1 | 0 |
| 1985 | 3 | 0 |
| 1986 | 3 | 0 |
| 1987 | 6 | 0 |
| 1988 | 6 | 0 |
| 1989 | 9 | 0 |
| 1990 | 9 | 0 |
| 1991 | 5 | 0 |
| 1992 | 11 | 0 |
| 1993 | 10 | 0 |
| 1994 | 13 | 0 |
| 1995 | 12 | 0 |
| 1996 | 18 | 0 |
| 1997 | 53 | 0 |
| 1998 | 77 | 0 |
| 1999 | 87 | 0 |
| 2000 | 76 | 0 |
| 2001 | 103 | 46 |
| 2002 | 89 | 78 |
| 2003 | 82 | 56 |
| 2004 | 61 | 49 |
| 2005 | 45 | 49 |
| 2006 | 36 | 35 |
| 2007 | 30 | 31 |
| 2008 | 26 | 29 |
| 2009 | 12 | 24 |
| 2010 | 14 | 23 |
| 2011 | 10 | 13 |
| 2012 | 14 | 19 |
| 2013 | 24 | 16 |
| 2014 | 21 | 14 |
| 2015 | 15 | 18 |
| 2016 | 15 | 15 |
| 2017 | 25 | 19 |
| 2018 | 18 | 13 |
| 2019 | 15 | 22 |
| 2020 | 21 | 23 |
| 2021 | 19 | 16 |
| 2022 | 16 | 16 |
| 2023 | 7 | 13 |
| 2024 | 8 | 21 |
| 2025 | 15 | 24 |
| 2026 | 9 | 22 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Electronic device manufacturing method and lithography control processor8 Sep 2026US 12,730,385 B2Gigaphoton Inc.
- Lithography system and methods21 Jul 2026US 12,687,785 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method and system for nanoscale data recording26 May 2026US 12,638,779 B2
- Spatial light modulation unit and exposure apparatus12 May 2026US 12,625,433 B2Nikon Corporation
- Lithography scanner throughput12 May 2026US 12,625,434 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Lithography system and methods8 Oct 2026US 2026/0310087 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Optical system including optical filter and corresponding method1 Oct 2026US 2026/0299430 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Pattern generator and method for driving pattern generator24 Sep 2026US 2026/0288013 A1Mycronic AB
- Lithographic apparatus and associated methods10 Sep 2026US 2026/0267234 A1ASML Netherlands B. V.
- Spatial light modulation unit and exposure apparatus27 Aug 2026US 2026/0251981 A1Nikon Corporation
Most cited
By later US patents
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Illumination device658US 5,296,891 AFraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. · 1994
- Projection exposure apparatus and method with workpiece area detection611US 6,191,429 B1Nikon Precision Inc. · 2001
- Projection exposure apparatus and method605US 6,122,036 ANikon Corporation · 2000
- Lithography system employing a solid immersion lens588US 5,121,256 AThe Board of Trustees of the Leland Stanford Junior University · 1992