G03F 7/70366
Rotary scanning
Official title: {Rotary scanning}
G03F7/70366 (Rotary scanning) appears on 67 US grants and 66 published applications in this corpus.
Search patents in G03F- Granted patents
- 67
- Published applications
- 66
- Assignees
- 31
- Inventors
- 122
- Latest grant
- 26 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 2 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 2 |
| 2002 | 3 | 3 |
| 2003 | 2 | 1 |
| 2004 | 2 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 3 |
| 2008 | 0 | 1 |
| 2009 | 1 | 1 |
| 2010 | 0 | 9 |
| 2011 | 1 | 2 |
| 2012 | 4 | 4 |
| 2013 | 8 | 2 |
| 2014 | 4 | 5 |
| 2015 | 3 | 6 |
| 2016 | 5 | 4 |
| 2017 | 3 | 2 |
| 2018 | 4 | 2 |
| 2019 | 1 | 5 |
| 2020 | 6 | 5 |
| 2021 | 3 | 2 |
| 2022 | 3 | 2 |
| 2023 | 0 | 0 |
| 2024 | 1 | 3 |
| 2025 | 1 | 1 |
| 2026 | 1 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method and system for nanoscale data recording26 May 2026US 12,638,779 B2
- Systems and methods for lithographic tools with increased tolerances4 Nov 2025US 12,461,449 B2ASML Netherlands B. V.
- Method and system for nanoscale data recording30 Jan 2024US 11,886,123 B2
- Supporting an optical element26 Apr 2022US 11,314,177 B2Carl Zeiss SMT GmbH
- System and method for overlay error reduction29 Mar 2022US 11,287,746 B1Taiwan Semiconductor Manufacturing Company.Ltd
- Substrate processing method and substrate processing apparatus16 Apr 2026US 2026/0107732 A1Tokyo Electron Limited
- Systems and methods for lithographic tools with increased tolerances16 Jan 2025US 2025/0021012 A1ASML Netherlands B. V.
- Exposure method, exposure device, and method of forming optically-anisotropic layer29 Aug 2024US 2024/0288678 A1FUJIFILM Corporation
- Method and system for nanoscale data recording25 Jul 2024US 2024/0248407 A1
- Drawing apparatus and drawing method23 May 2024US 2024/0168386 A1SCREEN Holdings Co., Ltd.
Most cited
By later US patents
- Lithography system employing a solid immersion lens588US 5,121,256 AThe Board of Trustees of the Leland Stanford Junior University · 1992
- Scanning type projection exposure system47US 4,844,568 AMatsushita Electric Industrial Co., Ltd. · 1989
- Method and apparatus for photolithography by rotational scanning33US 5,610,754 A1997
- Exposure apparatus32US 4,688,932 ACanon Kabushiki Kaisha · 1987
- Micro-lithographic method and apparatus using three-dimensional mask26US 6,576,406 B1Sarcos Investments LC · 2003