US 2025/0021012 A1 · SYSTEMS AND METHODS FOR LITHOGRAPHIC TOOLS WITH INCREASED TOLERANCES

Abstract

A method of use for a lithographic tool includes scanning a substrate relative to a first micro-lens array (MLA) and a second MLA each having rows of lenslets. The first MLA has functional lenslets and extra lenslets and the scanning includes delivering light through the lenslets of the first MLA and second MLA to the substrate. The delivering includes delivering light through the functional lenslets to form a pattern on the substrate, the pattern having gaps caused by a positional or rotational misalignment between the functional lenslets of the first MLA and the second MLA. The delivering also includes delivering light through the extra lenslets to fill the gaps in the pattern.

Claims20

Dependent claims

A method of use for a lithographic tool, the method comprising:

scanning a substrate relative to a first micro-lens array (MLA) and a second MLA, wherein each of the first MLA and second MLA has a plurality of rows of lenslets, wherein the first MLA has functional lenslets and extra lenslets, and wherein the scanning comprises delivering light through the lenslets of the first MLA and second MLA to the substrate, the delivering including:
delivering light through the functional lenslets to form a pattern on the substrate, the pattern having gaps caused by a positional or rotational misalignment between the functional lenslets of the first MLA and the second MLA, and
delivering light through the extra lenslets to fill the gaps in the pattern.

Dependencies are inferred from the claim text.

Facts

Application

18/577,035Filed 17 Jun 2022

Priority

EP 21186587.820 Jul 2021

Published

16 Jan 2025

Term ends

Not estimatedThe source records don’t support an estimate.

Classification7 codes

G03F 7/70275
Mask projection systems: multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
G03F 7/70291
Mask effects on the imaging process: addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid…
G03F 7/70358
Mask projection systems: scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
G03F 7/70366
Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging: rotary scanning

Systems and methods for lithographic tools with increased tolerances

Life of this patent

Systems and methods for lithographic tools with increased tolerances

Life of this patent

Abstract

Claims20