Substrate processing method and substrate processing apparatus

A substrate processing apparatus, comprising:

• a film former configured to form a film on a front surface of a substrate;
• a holder configured to hold the substrate;
• a periphery exposer configured to expose a peripheral edge region of the front surface of the substrate held by the holder;
• an image information acquisitor configured to acquire an image obtained by capturing the peripheral edge region of the front surface of the substrate having a first film formed on the front surface;
• an edge information generator configured to generate edge information indicating a relationship between a circumferential position around a center of the substrate and an outer edge position of the first film in a radial direction of the substrate based on the image;
• a film formation controller configured to control the film former to form a second film on at least the peripheral edge region of the front surface after the image is obtained;
• a state detector configured to acquire warpage information of the substrate after controlling a film formation;
• an exposure map setter configured to set an exposure map indicating a relationship between the circumferential position, a set value of an exposure width in the radial direction, and exposure position information of the substrate based on the edge information and the warpage information;
• and
• an exposure controller configured to control the periphery exposer and the holder to expose the second film in the peripheral edge region in accordance with the exposure map.