Exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorAkiyoshi Suzuki
Life of this patent
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Abstract
An exposure apparatus for use in the manufacture of semiconductor devices, for transferring an integrated circuit pattern of a reticle onto a semiconductor wafer by use of a projection lens optical system. A portion of the pattern of the reticle is irradiated with a light beam, and the light beam is scanningly deflected so that the whole of the pattern of the reticle is scanned with the light beam, whereby the pattern of the reticle is transferred onto the wafer. For compensation of a curvature of field of the projection lens optical system, the wafer is displaced in the direction of an optical axis of the projection lens optical system in accordance with the position of scan, on the reticle, whereby a high resolving power is assured over the entire surface of the reticle pattern. This allows enlargement of the pattern area of the reticle.
Claims17
An apparatus for transferring a pattern of a first object onto a second object, said apparatus comprising:
- a projection optical system for projecting and forming an image of the first object onto the second object;
- illumination means for irradiating a portion of the first object with a light beam;
- scanning means for scanningly deflecting the light beam from said illumination means so as to scan the first object with the light beam, so that the pattern of the first object is transferred onto the second object;
- and
- adjusting means for changing the positional relation between the image of the first object and the second object in response to the position of scanning on the first object by said scanning means, so as to conform to a characteristic of image formation of said projecting optical system, which characteristic varies in accordance with respective portions of the image of the first object to be projected by said projection optical system, said adjusting means being adapted to change the positional relation between the image of the first object and the second object with respect to a direction of an optical axis of said projection optical system.
An apparatus for transferring a pattern of a first object onto a second object, said apparatus comprising:
- a projection optical system for projecting and forming an image of the first object onto the second object;
- illumination means for irradiating a portion of the first object with a light beam;
- scanning means for scanningly deflecting the light beam from said illumination means so as to scan the first object with the light beam, so that the pattern of the first object is transferred onto the second object;
- and
- adjusting means for changing the positional relation between the image of the first object and the second object in response to the position of scanning on the first object by said scanning means, so as to conform to a characteristic of image formation of said projection optical system, which characteristic varies in accordance with respective portions of the image of the first object to be projected by said projection optical system, said adjusting means being adapted to displace the second object so as to change the positional relation thereof with respect to said projection optical system.
An apparatus for transferring a pattern of a first object onto a second object, said apparatus comprising:
- a projection optical system for projecting and forming an image of the first object onto the second object;
- illumination means for irradiating a portion of the first object with a light beam;
- scanning means for scanningly deflecting the light beam from said illumination means so as to scan the first object with the light beam, so that the pattern of the first object is transferred onto the second object;
- and
- adjusting means for changing the positional relation between the image of the first object and the second object in response to the position of scanning on the first object by said scanning means, so as to conform to a characteristic of image formation of said projection optical system, which characteristic varies in accordance with respective portions of the image of the first object to be projected by said projection optical system, said adjusting means being arranged to scanningly deflect the light beam from said illumination means so that the first object is spirally scanned with the light beam.
An apparatus for forming a pattern on an object, said apparatus comprising:
- a lens optical system having an optical axis;
- means for irradiating the object with a light beam by way of said lens optical system;
- means for deflecting the light beam from said irradiating means relative to said lens optical system so as to scan the object with the light beam thereby to form the pattern on the object;
- and
- means for adjusting a positional relation between said lens optical system and the object in the direction of the optical axis of said lens optical system, in association with the deflection of the light beam by said deflecting means.
An apparatus for transferring an image of a pattern onto an object, said apparatus comprising:
- a projection optical system for projecting the image of the pattern onto the object;
- means for irradiating the pattern with a light beam;
- means actable on the light beam, between said irradiating means and the pattern, for deflecting the light beam so as to scan the pattern with the light beam thereby to transfer the pattern onto the object;
- and
- means for adjusting a positional relation between the object and the image of the pattern as projected by said projection optical system, in association with the deflection of the light beam by said deflecting means.
A method of transferring an image of a pattern onto an object, said method comprising the steps of:
- placing the object on a stage which is movable in a direction of an optical axis of a projection optical system and in a direction parallel to a plane intersecting the optical axis of the projection optical system;
- scanning the pattern with a light beam so that the image of the pattern is transferred onto the object by way of the projection optical system;
- and
- adjusting a position of the object by use of the stage, in association with the scan of the pattern.
Dependencies are inferred from the claim text.