Electronic device manufacturing method and lithography control processor

An electronic device manufacturing method comprising:

• performing scanning exposure in which plural scan fields of a first photosensitive substrate are exposed to pulse laser light having a reference wavelength;
• measuring overlay error vectors at plural positions in each of the plural scan fields;
• calculating an average of the overlay error vectors at each of the plural positions in scan fields scanned in the same scan direction out of the plural scan fields;
• calculating an amount of wavelength adjustment with respect to the reference wavelength in such a way that a first overlay error parameter calculated by summing, along a direction that intersects with the scan direction, absolute values of sums of
• the averages and
• distortions obtained by multiplying a distortion sensitivity vector of a projection optical system of the exposure apparatus by the amount of wavelength adjustment of the pulse laser light from the reference wavelength
• is smaller than a second overlay error parameter calculated by summing absolute values of the averages along the direction that intersects with the scan direction;
• causing a laser apparatus to generate the pulse laser light having a wavelength controlled by using the amount of wavelength adjustment;
• outputting the pulse laser light to an exposure apparatus;
• and
• exposing a second photosensitive substrate to the pulse laser light in the exposure apparatus to manufacture electronic devices.