G03F 7/70258
Projection system adjustments
Official title: {Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system}
G03F7/70258 (Projection system adjustments) appears on 855 US grants and 1,001 published applications in this corpus.
Search patents in G03F- Granted patents
- 855
- Published applications
- 1,001
- Assignees
- 129
- Inventors
- 1,474
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 2 | 0 |
| 1986 | 1 | 0 |
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 3 | 0 |
| 1991 | 2 | 0 |
| 1992 | 5 | 0 |
| 1993 | 4 | 0 |
| 1994 | 1 | 0 |
| 1995 | 2 | 0 |
| 1996 | 5 | 0 |
| 1997 | 5 | 0 |
| 1998 | 9 | 0 |
| 1999 | 11 | 0 |
| 2000 | 8 | 0 |
| 2001 | 16 | 8 |
| 2002 | 11 | 21 |
| 2003 | 19 | 30 |
| 2004 | 26 | 40 |
| 2005 | 25 | 52 |
| 2006 | 35 | 57 |
| 2007 | 38 | 42 |
| 2008 | 29 | 46 |
| 2009 | 27 | 58 |
| 2010 | 29 | 38 |
| 2011 | 23 | 38 |
| 2012 | 29 | 27 |
| 2013 | 34 | 28 |
| 2014 | 41 | 34 |
| 2015 | 44 | 40 |
| 2016 | 33 | 39 |
| 2017 | 40 | 31 |
| 2018 | 46 | 48 |
| 2019 | 42 | 46 |
| 2020 | 35 | 45 |
| 2021 | 45 | 32 |
| 2022 | 27 | 33 |
| 2023 | 18 | 45 |
| 2024 | 22 | 32 |
| 2025 | 36 | 45 |
| 2026 | 24 | 46 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Mirror, optical system and method for operating an optical system6 Oct 2026US 12,754,483 B2Carl Zeiss SMT GmbH
- Projection lens, projection exposure apparatus and projection exposure method22 Sep 2026US 12,743,022 B2Carl Zeiss SMT GmbH
- Method of spatially aligning a patterning device and a substrate22 Sep 2026US 12,743,035 B2ASML Netherlands B. V.
- Adaptive optical element for microlithography15 Sep 2026US 12,736,885 B2Carl Zeiss SMT GmbH
- Tool mismatch reduction using aberration map of the tools25 Aug 2026US 12,717,244 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Optical apparatus, exposure apparatus and exposure method8 Oct 2026US 2026/0310089 A1SCREEN Holdings Co., Ltd.
- Image positioning control method and system17 Sep 2026US 2026/0277116 A1ASML Netherlands B. V.
- Adaptive optical module for a microlithographic projection exposure apparatus10 Sep 2026US 2026/0267133 A1
- Positioning system and method of forming the same3 Sep 2026US 2026/0259510 A1Agency for Science, Technology and Research
- Modulation of X-Ray Beam Intensity27 Aug 2026US 2026/0251980 A1LumArray, Inc.
Most cited
By later US patents
- Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors133US 5,581,324 ANikon Corporation · 1996
- Projection exposure apparatus110US 5,677,757 ANikon Corporation · 1997
- Projection exposure apparatus108US 5,117,255 ANikon Corporation · 1992
- Projection exposure method and apparatus105US 5,721,608 ANikon Corporation · 1998
- Projection exposure method and apparatus97US 6,404,482 B1Nikon Corporation · 2002