G03F 7/70266
Adaptive optics
Official title: {Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction}
G03F7/70266 (Adaptive optics) appears on 237 US grants and 315 published applications in this corpus.
Search patents in G03F- Granted patents
- 237
- Published applications
- 315
- Assignees
- 31
- Inventors
- 491
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 2 | 1 |
| 2002 | 1 | 2 |
| 2003 | 1 | 1 |
| 2004 | 3 | 8 |
| 2005 | 5 | 4 |
| 2006 | 4 | 16 |
| 2007 | 7 | 8 |
| 2008 | 7 | 11 |
| 2009 | 5 | 16 |
| 2010 | 7 | 13 |
| 2011 | 6 | 15 |
| 2012 | 7 | 7 |
| 2013 | 10 | 8 |
| 2014 | 15 | 11 |
| 2015 | 14 | 19 |
| 2016 | 14 | 12 |
| 2017 | 20 | 16 |
| 2018 | 13 | 14 |
| 2019 | 13 | 9 |
| 2020 | 11 | 14 |
| 2021 | 14 | 10 |
| 2022 | 7 | 15 |
| 2023 | 4 | 23 |
| 2024 | 10 | 15 |
| 2025 | 18 | 22 |
| 2026 | 11 | 25 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Mirror, optical system and method for operating an optical system6 Oct 2026US 12,754,483 B2Carl Zeiss SMT GmbH
- Projection lens, projection exposure apparatus and projection exposure method22 Sep 2026US 12,743,022 B2Carl Zeiss SMT GmbH
- Adaptive optical element for microlithography15 Sep 2026US 12,736,885 B2Carl Zeiss SMT GmbH
- Optical apparatus, method for setting a target deformation, and lithography system16 Jun 2026US 12,656,690 B2Carl Zeiss SMT GmbH
- Method and device for measuring actuators in a projection exposure apparatus for semiconductor lithography9 Jun 2026US 12,650,450 B2Carl Zeiss SMT GmbH
- Optical apparatus, exposure apparatus and exposure method8 Oct 2026US 2026/0310089 A1SCREEN Holdings Co., Ltd.
- Adaptive optical module for a microlithographic projection exposure apparatus10 Sep 2026US 2026/0267133 A1
- Modulation of X-Ray Beam Intensity27 Aug 2026US 2026/0251980 A1LumArray, Inc.
- Method for determining an optical property30 Jul 2026US 2026/0219583 A1ASML Netherlands B. V.
- Method of setting up a projection exposure system, a projection exposure method and a projection exposure system for microlithography23 Jul 2026US 2026/0211338 A1ASML Netherlands B. V.
Most cited
By later US patents
- Adaptive optic wafer stepper illumination system68US 5,142,132 ALitel Instruments · 1992
- Illumination system and method employing a deformable mirror and diffractive optical elements67US 5,684,566 ASVG Lithography Systems, Inc. · 1997
- Projection exposure apparatus and microdevice manufacturing method55US 5,805,273 ACanon Kabushiki Kaisha · 1998
- Deformable mirror for short wavelength applications54US 5,986,795 A1999
- Projection optical apparatus for projecting a mask pattern onto the surface of a target projection object and projection exposure apparatus using the same46US 5,793,473 ANikon Corporation · 1998