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US 5,805,273 AGranted
Projection exposure apparatus and microdevice manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorYasuyuki Unno
Life of this patent
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Abstract
A projection exposure apparatus includes a projection optical system for projecting a pattern of a first object onto a second object, and a correcting device for substantially correcting rotational asymmetry in optical characteristic of the projection optical system to be produced in the projection optical system with an exposure process.
Claims24
A scanning projection exposure apparatus, comprising:
- illumination means for illuminating a first object with exposure light having a slit-like section shape;
- a projection optical system for projecting a pattern of the first object onto a second object;
- scanning means for relatively scanning the first and second objects in a scanning direction relative to the exposure light and said Projection optical system;
- and
- correcting means for substantially correcting a difference, caused in relation to said projection optical system during the scanning exposure between an optical characteristic in a sectional plane including the scanning direction and an optical characteristic in a sectional plane including a direction perpendicular to the scanning direction.
2 more elements
Dependencies are inferred from the claim text.