Projection optical apparatus for projecting a mask pattern onto the surface of a target projection object and projection exposure apparatus using the same

A projection exposure apparatus for projecting and exposing an image of a pattern on one of a reticle and a mask onto a surface of a photosensitive substrate, comprising:

• an illumination optical system;
• a first stage, arranged so that one of said reticle and said mask receives an illumination light from said illumination optical system, for supporting one of said reticle and said mask;
• an intermediate image formation optical system, arranged so as to receive a light beam from one of said reticle and said mask, for forming an intermediate image of said pattern on the basis of the light beam from one of said reticle and said mask;
• reflector having a reflecting surface arranged near a position where the intermediate image is formed;
• a re-imaging optical system, arranged so as to receive a light beam reflected by said reflector, for forming the intermediate image of said pattern onto said surface of said photosensitive substrate again on the basis of the light beam reflected by said reflector;
• and
• a second stage, arranged so that said photosensitive substrate receives a light beam from said re-imaging optical system, for supporting said photosensitive substrate;
• wherein said reflector imparts a wavefront aberration according to a deformed state of said surface of said photosensitive substrate to the light beam from said intermediate image formation optical system by deforming said reflecting surface.

A method for fabricating a semiconductor device, comprising:

• a step of emitting an illumination light;
• a step of illuminating a circuit pattern on one of a mask and a reticle based on said illumination light;
• a step of forming an intermediate image based on the illumination light passing through one of said mask and said reticle;
• a step of reflecting the illumination light by a reflector arranged substantially at a position where said intermediate image is formed;
• and
• a step of forming a secondary image of said circuit pattern on a photosensitive substrate based on the light reflected by said reflector,
• wherein said secondary image is formed by light from said intermediate image,
• a total image is formed by light from said secondary image, and
• said circuit pattern is transferred from one of said mask and said reticle to said photosensitive substrate by a singular step.

A projection exposure apparatus for projecting and transferring an image of a pattern on one of a reticle and a mask onto a photosensitive substrate, comprising;

• a light source;
• an illumination optical system;
• a first stage;
• a second stage;
• a first refraction optical system;
• a deformable mirror;
• and
• a second refraction optical system,
• wherein said light source, said illumination optical system, said first and first and second stages, said first and second refraction optical systems and said deformable mirror are so arranged that light from said light source passes through said illumination optical system, passes through one of said reticle and mask supported by said first stage, passes through said first refraction optical system, then the light from said light source is reflected by said deformable mirror, passes through said second refraction optical system, reaches said photosensitive substrate supported by said second stage,
• said first refraction optical system forms a primary image of the pattern of one of said reticle and said mask near said deformable mirror by using light from one of said reticle and said mask,
• said second refraction optical system forms a secondary image of said pattern of one of said reticle and said mask on said photosensitive substrate by using light from said primary image, and
• said pattern is transferred from one of said reticle and said mask to said photosensitive substrate by a singular step.

A method of manufacturing a projection type exposure apparatus which performs the projection-transfer of a pattern image on either one of a reticle and a mask, on a photosensitive substrate, said method comprising the steps of:

• preparing an illumination optical system including a light source;
• preparing a first stage supporting either one of said reticle and said mask;
• preparing an intermediate image forming optical system for forming an intermediate image of said pattern image based on light passing through said illumination optical system;
• arranging a deformable mirror in adjacent to a position at which said intermediate image is formed;
• and
• preparing re-imaging optical system for forming an image of said intermediate image on said photosensitive substrate based on light reflected by said deformable mirror, wherein said intermediate image forming optical system, said deformable mirror and said re-imaging optical system are arranged so that said pattern image is formed on said photosensitive substrate at one step.