G03F 7/70241
Optical aspects of refractive lens systems, i.e. comprising only refractive elements
Official title: {Optical aspects of refractive lens systems, i.e. comprising only refractive elements}
G03F7/70241 (Optical aspects of refractive lens systems, i.e. comprising only refractive elements) appears on 488 US grants and 238 published applications in this corpus.
Search patents in G03F- Granted patents
- 488
- Published applications
- 238
- Assignees
- 93
- Inventors
- 608
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 2 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 4 | 0 |
| 1986 | 5 | 0 |
| 1987 | 8 | 0 |
| 1988 | 5 | 0 |
| 1989 | 7 | 0 |
| 1990 | 12 | 0 |
| 1991 | 7 | 0 |
| 1992 | 11 | 0 |
| 1993 | 7 | 0 |
| 1994 | 14 | 0 |
| 1995 | 15 | 0 |
| 1996 | 13 | 0 |
| 1997 | 30 | 0 |
| 1998 | 38 | 0 |
| 1999 | 36 | 0 |
| 2000 | 23 | 0 |
| 2001 | 33 | 16 |
| 2002 | 27 | 27 |
| 2003 | 35 | 32 |
| 2004 | 24 | 28 |
| 2005 | 24 | 27 |
| 2006 | 16 | 22 |
| 2007 | 18 | 19 |
| 2008 | 18 | 15 |
| 2009 | 6 | 3 |
| 2010 | 6 | 5 |
| 2011 | 6 | 1 |
| 2012 | 1 | 2 |
| 2013 | 1 | 4 |
| 2014 | 1 | 2 |
| 2015 | 2 | 2 |
| 2016 | 3 | 3 |
| 2017 | 2 | 4 |
| 2018 | 4 | 7 |
| 2019 | 3 | 4 |
| 2020 | 6 | 4 |
| 2021 | 5 | 4 |
| 2022 | 2 | 2 |
| 2023 | 0 | 0 |
| 2024 | 1 | 2 |
| 2025 | 2 | 2 |
| 2026 | 2 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Projection lens, projection exposure apparatus and projection exposure method22 Sep 2026US 12,743,022 B2Carl Zeiss SMT GmbH
- Photolithography projection lens5 May 2026US 12,619,053 B2Sun Yang Optics Development Co., Ltd.
- Optical system1 Jul 2025US 12,346,033 B2Carl Zeiss SMT GmbH
- Transmissive diffusor8 Apr 2025US 12,271,008 B2ASML Netherlands B. V.
- Lithography projection objective13 Feb 2024US 11,899,181 B2Shanghai Micro Electronics Equipment (Group) Co., Ltd.
- Non-contact temperature sensor for a mirror, projection lens and method for measuring the temperature of a mirror30 Apr 2026US 2026/0118777 A1
- Chromatically corrected imaging illumination optical unit for use in a lithographic projection exposure apparatus6 Nov 2025US 2025/0341782 A1
- Projection lens, projection exposure apparatus and projection exposure method2 Jan 2025US 2025/0004382 A1Carl Zeiss SMT GmbH
- Photolithography projection lens14 Mar 2024US 2024/0085667 A1Sun Yang Optics Development Co., Ltd.
- Photomask processing apparatus and method of processing photomask15 Feb 2024US 2024/0053685 A1Semes Co., Ltd.
Most cited
By later US patents
- Photolithographic method for the manufacture of integrated circuits1,126US 4,346,164 A1982
- Pattern forming apparatus1,002US 4,480,910 AHitachi, Ltd. · 1984
- Apparatus for the photolithographic manufacture of integrated circuit elements958US 4,509,852 A1985
- Lithography system employing a solid immersion lens588US 5,121,256 AThe Board of Trustees of the Leland Stanford Junior University · 1992
- Microlens scanner for microlithography and wide-field confocal microscopy461US 6,133,986 A2000