Photolithography projection lens

A photolithography projection lens, comprising:

• a plurality of lens elements disposed along an optical axis and a light diaphragm arranged amongst the plurality of lens elements along the optical axis, and an object side and an image side are, respectively, defined at front and rear ends of the plurality of lens elements;
• and
• a prism set in front of the object side, and negative lens elements of the plurality of lens elements disposed before and after the light diaphragm satisfies an Abbe number of 30<Vd<50, and each of the plurality of lens elements satisfy a refractive index of 1.45<Nd<1.75 and a numerical aperture between 0.08 and 0.21;
• wherein diopters of two lens elements of the plurality of lens elements that are, respectively, closest to the object side and the image side are positive;
• wherein each of the plurality of lens elements is formed of a single lens that does not include cement;
• wherein an angle between chief rays at different image height positions and the optical axis is <1 degree and an angle between chief rays at different object height positions and the optical axis is <1 degree;
• and
• thereby responsive to projection of 350˜450 nm wavelength light, an imaging effect of a magnification within a nominal range is generated;
• wherein at least one of a first lens element of the plurality of lens elements closest to the object side and a first lens element of the plurality of lens elements closest to the image side is a non-biconvex lens.