G03F 7/7025
Size or form of projection system aperture
Official title: {Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof}
G03F7/7025 (Size or form of projection system aperture) appears on 150 US grants and 142 published applications in this corpus.
Search patents in G03F- Granted patents
- 150
- Published applications
- 142
- Assignees
- 31
- Inventors
- 233
- Latest grant
- 2 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 5 | 0 |
| 1999 | 4 | 0 |
| 2000 | 5 | 0 |
| 2001 | 7 | 4 |
| 2002 | 5 | 2 |
| 2003 | 6 | 8 |
| 2004 | 3 | 3 |
| 2005 | 5 | 8 |
| 2006 | 8 | 9 |
| 2007 | 6 | 11 |
| 2008 | 2 | 5 |
| 2009 | 6 | 5 |
| 2010 | 4 | 9 |
| 2011 | 7 | 4 |
| 2012 | 6 | 11 |
| 2013 | 9 | 2 |
| 2014 | 7 | 7 |
| 2015 | 2 | 7 |
| 2016 | 6 | 7 |
| 2017 | 7 | 4 |
| 2018 | 7 | 7 |
| 2019 | 6 | 3 |
| 2020 | 5 | 3 |
| 2021 | 2 | 4 |
| 2022 | 3 | 4 |
| 2023 | 2 | 3 |
| 2024 | 4 | 4 |
| 2025 | 1 | 5 |
| 2026 | 3 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Optical system, projection exposure system and method2 Jun 2026US 12,645,158 B2Carl Zeiss SMT GmbH
- Method and system for nanoscale data recording26 May 2026US 12,638,779 B2
- Systems and methods for reducing pattern shift in a lithographic apparatus5 May 2026US 12,619,160 B2ASML Netherlands B. V.
- Stop, optical system and lithography apparatus11 Feb 2025US 12,222,655 B2Carl Zeiss SMT GmbH
- Image-forming optical system, exposure apparatus, and device producing method1 Oct 2024US 12,105,428 B2Nikon Corporation
- Optical system for a projection exposure apparatus, and method for specifying an illumination pupil13 Aug 2026US 2026/0235866 A1
- Methods And Systems For In-Situ Discovery Of Illumination Angles In Semiconductor Measurements2 Apr 2026US 2026/0093185 A1
- Aperture correction amount calculation method for aperture array substrate, aperture array substrate, blanking aperture array substrate, multiple charged-particle beam writing apparatus, and multiple charged-particle beam writing method8 Jan 2026US 2026/0010079 A1NuFlare Technology, Inc.
- Diffraction-based pupil determination for optimization of lithographic processes21 Aug 2025US 2025/0264808 A1ASML Netherlands B. V.
- Method of using lithography apparatus3 Jul 2025US 2025/0216795 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Catadioptric system for photolithography217US 5,835,275 ANikon Corporation · 1998
- Exposure apparatus and method124US 5,673,103 AKabushiki Kaisha Toshiba · 1997
- X-ray reduction projection exposure system of reflection type112US 5,153,898 ACanon Kabushiki Kaisha · 1992
- Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure97US 6,078,380 ANikon Corporation · 2000
- Microlithography reduction objective and projection exposure apparatus94US 6,353,470 B12002