Aperture correction amount calculation method for aperture array substrate, aperture array substrate, blanking aperture array substrate, multiple charged-particle beam writing apparatus, and multiple charged-particle beam writing method

A multiple charged-particle beam writing apparatus comprising:

• a beam source that emits a charged particle beam;
• a shaping aperture array substrate, which is divided into regions serving as blocks and in which a plurality of first apertures with positional shifts or dimensional variations are formed on a block-by-block basis, a region that includes all the plurality of first apertures is irradiated with the charged particle beam, and multiple beams are formed by portions of the charged particle beam passing through the plurality of respective first apertures;
• a blanking aperture array substrate, in which a plurality of second apertures are formed through which corresponding respective beams among the multiple beams pass, and each second aperture is provided with a blanker for performing blanking deflection on the beam;
• and
• a deflector that deflects, in a collective manner, the beams that have passed through the plurality of second apertures and adjusts a beam irradiation position on a writing target substrate.

A multiple charged-particle beam writing method comprising:

• emitting a charged particle beam;
• irradiating, with the charged particle beam, a shaping aperture array substrate, which is divided into regions serving as blocks and in which a plurality of first apertures with positional shifts or dimensional variations are formed on a block-by-block basis, and forming multiple beams by portions of the charged particle beam passing through the plurality of respective first apertures;
• performing on-off control on each beam using a blanking aperture array substrate, in which a plurality of second apertures are formed through which corresponding respective beams among the multiple beams pass, and each second aperture is provided with a blanker for performing blanking deflection on the beam;
• and
• deflecting, in a collective manner, the beams that have passed through the plurality of second apertures using a deflector to radiate the beams onto a writing target substrate.