Image-forming optical system, exposure apparatus, and device producing method

An exposure apparatus comprising:

• an illumination optical system which includes a fly's eye optical system including a plurality of reflecting elements arranged on an arrangement plane, and which is configured to illuminate a pattern formed on a reflective-type mask arranged on a first plane with a radiation from the fly's eye optical system;
• and
• a projection optical system configured to form an image of the pattern on a substrate arranged on a second plane by using a radiation from the pattern,
• wherein an illumination area of the illumination optical system is formed on the first plane at a position deviated from an optical axis of the projection optical system in a first direction;
• wherein an entrance pupil of the projection optical system has a size in the first direction and a size in a second direction crossing the first direction, the size in the second direction being larger than the size in the first direction;
• wherein a radiation emitted from the illumination optical system so as to travel toward the illumination area is inclined with respect to the optical axis of the projection optical system;
• and
• the radiation from the pattern coming into the projection optical system from the illumination area is inclined with respect to the optical axis of the projection optical system.