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US 12,645,158 B2Granted
Optical system, projection exposure system and method
AssigneeCarl Zeiss SMT GmbH
InventorsMartin von Hodenberg, Toralf Gruner
Life of this patent
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Abstract
An optical system for a projection exposure apparatus comprises: an obscuration stop, a stop for the numerical aperture or an extraneous light stop, at least portions of which are arranged in a beam path of the optical system to shade at least portions of the beam path; a heating device for introducing heat into the stop, the stop being deformable from an initial geometry into a design geometry with the aid of the introduction of the heat; and a temperature sensor, a photo element and/or an infrared camera.
Claims21
An optical system, comprising:
- a stop selected from the group consisting of an obscuration stop, a stop for the numerical aperture and an extraneous light stop, at least portions of the stop being arranged in a beam path of the optical system to shade at least portions of the beam path;
- a heating device configured to introduce heat into the stop to deform the stop from an initial geometry to a design geometry;
- a temperature sensor, a photo element and/or an infrared camera;
- and
- a control device configured to:
- i) determine a local stop temperature distribution of the stop based on:
- a) measurement signals from the temperature sensor, the photo element and/or the infrared camera;
- and/or b) information relating to a temperature distribution of further optical elements arranged at a comparable position to the stop in the beam path;
- and
- ii) control the heating device to obtain a target stop temperature distribution of the stop.
7 more elements
A method, comprising:
- a) providing a stop selected from the group consisting of an obscuration stop, a stop for the numerical aperture and an extraneous light stop, at least portions of the stop being arranged in a beam path of an optical system for a projection exposure apparatus so that at least portions of the beam path are shaded by the stop;
- b) introducing heat into the stop using a heating device;
- and
- c) deforming the stop from an initial geometry to a design geometry with the aid of the heat,
- wherein b) comprises determining a local stop temperature distribution of the stop based on:
- i) measurement signals from a temperature sensor, a photo element and/or an infrared camera;
- and/or ii) information relating to a temperature distribution of further optical elements arranged at a comparable position to the stop in the beam path, and
- wherein the method further comprises controlling the heating device to obtain a target stop temperature distribution of the stop.
5 more elements
Dependencies are inferred from the claim text.