Systems and methods for reducing pattern shift in a lithographic apparatus
AssigneeASML Netherlands B.V.
InventorsJoost Cyrillus Lambert Hageman, Marie-Claire Van Lare, Hans Van Der Laan
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Abstract
A method for improving imaging of a feature on a mask to a substrate during scanning operation of a lithographic apparatus. The method includes obtaining a dynamic pupil representing evolution of an angular distribution of radiation exposing a mask during a scanning operation of a lithographic apparatus and determining a variation of shift of a feature at a substrate during the scanning operation due to interaction of the dynamic pupil with the mask. The method includes configuring a mask parameter and/or or a control parameter of the lithographic apparatus to reduce the variation of shift of the feature.
Claims20
A non-transitory computer-readable medium having instructions that, when executed by a computer system, are configured to cause the computer system to at least:
- obtain a dynamic pupil representing evolution of an angular distribution of an intensity of radiation to expose a mask during a scanning operation of a lithographic apparatus;
- determine a variation of shift of a feature at a substrate during the scanning operation due to interaction of the dynamic pupil with the mask;
- and
- configure a mask parameter and/or a control parameter of the lithographic apparatus, to reduce the variation of shift of the feature.
A computer-implemented method for improving imaging of a feature on a mask to a substrate during a scanning operation of a lithographic apparatus, the method comprising:
- obtain a dynamic pupil representing evolution of an angular distribution of an intensity of radiation to expose a mask during a scanning operation of a lithographic apparatus;
- determine a variation of shift of a feature at a substrate during the scanning operation due to interaction of the dynamic pupil with the mask;
- and
- configure a mask parameter and/or a control parameter of the lithographic apparatus, to reduce the variation of shift of the feature.
A method for improving imaging of a feature on a mask to a substrate during scanning operation of a lithographic apparatus, the method comprising:
- obtaining a dynamic pupil representing evolution of an angular distribution of radiation to expose the mask during scanning operation of the lithographic apparatus;
- determining, by a hardware computer system, a variation of shift of a feature at a substrate during the scanning operation due to interaction of the dynamic pupil with the mask;
- and
- configuring a lithographic process related parameter to reduce the variation of shift of the feature, wherein the lithographic process related parameter includes at least one selected from:
- a design of the mask, a reticle stage of the lithographic apparatus holding the mask, a wafer stage of the lithographic apparatus holding the substrate, an illumination within the lithographic apparatus, or a projection lens of the lithographic apparatus.
Dependencies are inferred from the claim text.