G03F 7/70233
Optical aspects of catoptric systems, i.e. comprising only reflective elements
Official title: {Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems}
G03F7/70233 (Optical aspects of catoptric systems, i.e. comprising only reflective elements) appears on 477 US grants and 465 published applications in this corpus.
Search patents in G03F- Granted patents
- 477
- Published applications
- 465
- Assignees
- 87
- Inventors
- 709
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 1 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 2 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 2 | 0 |
| 1986 | 2 | 0 |
| 1987 | 7 | 0 |
| 1988 | 4 | 0 |
| 1989 | 3 | 0 |
| 1990 | 2 | 0 |
| 1991 | 4 | 0 |
| 1992 | 5 | 0 |
| 1993 | 6 | 0 |
| 1994 | 7 | 0 |
| 1995 | 4 | 0 |
| 1996 | 7 | 0 |
| 1997 | 7 | 0 |
| 1998 | 5 | 0 |
| 1999 | 7 | 0 |
| 2000 | 13 | 0 |
| 2001 | 23 | 5 |
| 2002 | 20 | 25 |
| 2003 | 16 | 29 |
| 2004 | 23 | 43 |
| 2005 | 25 | 29 |
| 2006 | 26 | 22 |
| 2007 | 27 | 23 |
| 2008 | 25 | 22 |
| 2009 | 18 | 19 |
| 2010 | 7 | 16 |
| 2011 | 10 | 16 |
| 2012 | 8 | 26 |
| 2013 | 11 | 14 |
| 2014 | 17 | 20 |
| 2015 | 17 | 12 |
| 2016 | 21 | 7 |
| 2017 | 17 | 14 |
| 2018 | 16 | 12 |
| 2019 | 9 | 10 |
| 2020 | 10 | 11 |
| 2021 | 10 | 5 |
| 2022 | 4 | 2 |
| 2023 | 2 | 7 |
| 2024 | 5 | 18 |
| 2025 | 2 | 36 |
| 2026 | 14 | 22 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Optical system and method for a radiation source6 Oct 2026US 12,757,311 B2ASML Netherlands B. V.
- Assembly for a laser-operated light source and method of use15 Sep 2026US 12,736,884 B2ASML Netherlands B. V.
- Method for depositing a cover layer, EUV lithography system and optical element4 Aug 2026US 12,699,330 B2Carl Zeiss SMT GmbH
- Imaging optical unit30 Jun 2026US 12,669,755 B2Carl Zeiss SMT GmbH
- Extreme ultraviolet light generation system and electronic device manufacturing method30 Jun 2026US 12,669,756 B2Gigaphoton Inc.
- Lithography apparatus and method for operating the same24 Sep 2026US 2026/0288022 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Lithographic apparatus and associated methods10 Sep 2026US 2026/0267234 A1ASML Netherlands B. V.
- Optical element and euv lithography system3 Sep 2026US 2026/0259504 A1Carl Zeiss SMT GmbH
- Measurement system, measurement method with the aid of such a measurement system, and projection exposure apparatus comprising such a measurement system6 Aug 2026US 2026/0227714 A1
- Imaging optical unit16 Jul 2026US 2026/0202752 A1Carl Zeiss SMT GmbH
Most cited
By later US patents
- Immersion photolithography system and method using inverted wafer-projection optics interface156US 6,809,794 B1ASML Holding N. V. · 2004
- Multi-layered mirror152US 6,441,963 B2Nikon Corporation · 2002
- High numerical aperture ring field optical reduction system150US 5,815,310 ASVG Lithography Systems, Inc. · 1998
- Apparatus for semiconductor lithography124US 5,063,586 AAT&T Bell Laboratories · 1991
- High numerical aperture ring field projection system for extreme ultraviolet lithography123US 6,033,079 A2000