Immersion photolithography system and method using inverted wafer-projection optics interface
AssigneeASML Holding N.V.
InventorHarry Sewell
Life of this patent
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Abstract
A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation, and also includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides a liquid between the projection optical system and the substrate. The projection optical system is positioned below the substrate.
Claims42
A liquid immersion photolithography system comprising:
- an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate;
- and
- a liquid supply system that provides a liquid between the projection optical system and the substrate,
- wherein the projection optical system is positioned below the substrate.
A liquid immersion photolithography system comprising:
- an exposure system that exposes a substrate and includes a projection optical system;
- and
- means for providing a liquid between the projection optical system and the substrate,
- wherein the projection optical system is positioned below the substrate.
A liquid immersion photolithography system comprising:
- an exposure system that includes a projection optical system;
- and
- a liquid supply system adapted for providing a liquid between the projection optical system and the substrate,
- wherein the projection optical system is adapted for positioning below the substrate.
A liquid immersion photolithography system comprising:
- an exposure system that includes a projection optical system;
- and
- a liquid supply system adapted for providing a liquid between the projection optical system and the substrate,
- wherein the liquid supply system is adapted for forming a liquid meniscus above the projection optical system.
An upwardly directed projection optical system comprising:
- a housing including a hydrophobic upper portion and having an opening formed in the hydrophobic upper portion;
- a catch basin around a periphery of the housing;
- a plurality of lenses adapted for upward exposure of a substrate;
- and
- a liquid seal around a final lens element of the projection optical system.
A method of exposing a substrate comprising:
- positioning a projection optical system below the substrate;
- projecting electromagnetic radiation onto the substrate using a projection optical system;
- and
- delivering a liquid between the projection optical system and the substrate.
Dependencies are inferred from the claim text.