High numerical aperture ring field optical reduction system

An optical reduction system for use in photolithography, from the long conjugate end to the short conjugate end, comprising:

• a first mirror pair;
• a field mirror pair, said field mirror pair positioned to receive a chief ray reflected from said first mirror pair diverging away from an optical axis and converting it to a chief ray converging towards the optical axis;
• and
• a third mirror pair, said third mirror pair positioned to receive the chief ray reflected from said field mirror pair,
• wherein said first mirror pair, said field mirror pair, and said third mirror pair are positioned between a first plane formed by the long conjugate end and a second plane formed by the short conjugate end while progressing in a single direction along the optical axis,
• whereby a reduced image of an object is formed and the first plate and the second plane are accessible for parallel scanning.

An optical reduction system for use in photolithography, from the long conjugate end to the short conjugate end, comprising:

• a first concave mirror;
• a second mirror;
• a third concave mirror;
• a fourth concave mirror;
• a fifth convex mirror;
• and
• a sixth concave mirror,
• wherein said first concave mirror, said second mirror, said third concave mirror, said fourth concave mirror, said fifth convex mirror, and said sixth concave mirror are all positioned between a first plane formed by the long conjugate end and a second plane formed by the short conjugate end while progressing in a single direction along an optical axis,
• whereby two of said first, second, third, fourth, fifth or sixth mirrors act as a field mirror pair.

An optical reduction system for use in photolithography, from the long conjugate end to the short conjugate end, comprising:

• a first concave mirror;
• a second mirror, positioned to receive reflected electromagnetic radiation from said first concave mirror;
• a third concave mirror positioned to receive reflected electromagnetic radiation from said second mirror;
• a fourth concave mirror positioned to receive reflected electromagnetic radiation from said third concave mirror;
• a fifth convex mirror positioned to receive reflected electromagnetic radiation from said fourth concave mirror;
• and
• a sixth concave mirror positioned to receive reflected electromagnetic radiation from said fifth convex mirror,
• said first, second, third, fourth, fifth and sixth mirrors having an optical axis,
• said third concave mirror receiving a chief ray diverging away from the optical axis, and
• said fourth concave mirror receiving the chief ray reflected from said third concave mirror and reflecting the chief ray causing it to converge toward the optical axis,
• wherein said first concave mirror, said second mirror, said third concave mirror, said fourth concave mirror, said fifth convex mirror, and said sixth concave mirror are all positioned between the lone conjugate end and the short conjugate end while progressing in a single direction alone the optical axis,
• whereby the long conjugate end and the short conjugate end are accessible for parallel scanning.

An optical reduction system for use in photolithography, from the long conjugate end to the short conjugate end, comprising:

• a first concave mirror,
• a second mirror positioned to receive reflected electromagnetic radiation from said first concave mirror;
• a third concave mirror positioned to receive reflected electromagnetic radiation from said second mirror;
• a fourth concave mirror positioned to receive reflected electromagnetic radiation from said third concave mirror;
• a fifth convex mirror positioned to receive reflected electromagnetic radiation from said fourth concave mirror;
• and
• a sixth concave mirror positioned to receive reflected electromagnetic radiation from said fifth convex mirror,
• said first, second, third, fourth, fifth and sixth mirrors having a radius of curvature on an optical axis,
• said third concave mirror receiving a chief ray diverging away from the optical axis,
• said fourth concave mirror receiving the chief ray reflected from said third concave mirror and reflecting the chief ray causing it to converse toward the optical axis;
• a first refractive element located between an object and said second mirror;
• a second refractive element located near said second mirror;
• and
• a third refractive element located between an image and said fifth mirror.

An optical reduction system for use in photolithography comprising:

• a plurality of curved mirror pairs constructed according to the optical construction data of the following Table 1
• TABLE1 ______________________________________ Radius of Element Curvature Aperture Diameter Number Front Back Thickness Front Back Glass ______________________________________ object Infinity 571.0624 236.9146 192.0526 1 A(1) -192.0526 233.4582 Refl Aperture Stop 46.3098 0.0000 2 A(2) 0.0000 45.7172 Refl 45.2145 432.1152 3 A(3) -490.5496 334.0156 Refl 4 A(4) 490.5496 503.2223 Refl 240.0123 -62.8918 261.2488 320.6990 5 A(5) -320.6990 86.6738 Refl 6 A(6) 320.6990 227.7070 Refl 72.1652 Image Distance = 22.3092 Image INF 62.0000 ______________________________________
• wherein the aspheric constants are given by the following equation and Table 1A ##EQU4##
• TABLE 1A __________________________________________________________________________ Aspheric Curv K A B C D __________________________________________________________________________ A(1) -0.00204178 0.000000 6.26871E - 10 -1.09535E - 15 1.29067E - 20 8.68980E - 26 A(2) -0.00248086 0.000000 1.05970E - 08 4.81436E - 13 -1.10750E - 15 7.52743E - 19 A(3) -0.00048280 0.000000 2.18257E - 11 2.87915E - 15 6.04832E - 20 3.68423E - 25 A(4) 0.00101457 0.000000 3.42885E - 11 -4.85608E - 16 -3.57675E - 22 1.81445E - 26 A(5) 0.00355137 0.000000 1.77414E - 08 1.15815E - 12 7.13212E - 17 -4.35391E - 21 A(6) 0.00258825 0.000000 1.36198E - 10 1.22849E - 15 8.27928E - 21 1.16903E - 25 __________________________________________________________________________

An optical reduction system for use in photolithography comprising:

• a plurality of curved mirror pairs constructed according to the optical construction data of the following Table 2
• TABLE2 ______________________________________ Radius of Element Curvature Aperture Diameter Number Front Back Thickness Front Back Glass ______________________________________ object Infinity 407.8161 357.5906 264.5379 1 A(1) -264.5379 419.5247 Refl Aperture Stop 77.5026 0.0000 2 A(2) 0.0000 74.9379 Refl 77.3224 390.2371 3 A(3) -260.0000 467.2174 Refl 4 A(4) 260.0000 527.2466 Refl 240.4502 -5.6992 206.6446 186.2863 5 A(5) -186.2863 92.0895 Refl 6 A(6) 186.2863 272.0463 Refl 82.3061 Image Distance = 20.0000 Image INF 60.9996 ______________________________________
• wherein the aspheric constants are given by the following equation and Table 2A ##EQU5##
• TABLE 2A __________________________________________________________________________ K A B C D Aspheric Curv E F G H J __________________________________________________________________________ A(1) -0.00184131 0.000000 2.24506E - 12 -1.06529E - 15 1.40153E - 20 -1.45525E - 26 0.00000E + 00 0.00000E + 00 0.00000E + 00 0.00000E + 00 0.00000E + 00 A(2) -0.00344767 0.000000 2.70239E - 08 6.29102E - 12 1.39941E - 15 -1.11823E - 19 3.43046E - 23 0.00000E + 00 0.00000E + 00 0.00000E + 00 0.00000E + 00 A(3) -0.00073996 0.000000 3.47651E - 10 1.86467E - 16 -3.27086E - 20 1.15234E - 25 0.00000E + 00 0.00000E + 00 0.00000E + 00 0.00000E + 00 0.00000E + 00 A(4) 0.00145483 0.000000 -6.10242E - 11 7.82453E - 16 -8.98158E - 21 -4.15911E - 26 0.00000E + 00 0.00000E + 00 0.00000E + 00 0.00000E + 00 0.00000E + 00 A(5) 0.00444460 0.000000 1.67615E - 07 1.75232E - 11 8.40253E - 16 8.38291E - 20 6.03283E - 23 0.00000E + 00 0.00000E + 00 0.00000E + 00 0.00000E + 00 A(6) 0.00442274 0.000000 5.24492E - 10 8.43072E - 15 4.12933E - 19 -9.76520E - 24 5.15810E - 28 0.00000E + 00 0.00000E + 00 0.00000E + 00 0.00000E + 00 __________________________________________________________________________

An optical reduction system for use in photolithography comprising:

• a plurality of curved mirror pairs and refractive elements constructed according to the optical construction data of the following Table 3
• TABLE3 __________________________________________________________________________ Element Radius of Curvature Aperature Diameter Number Front Back Thickness Front Back Glass __________________________________________________________________________ Object INF 363.7117 1 528.5985 CX 560.6353 CC 30.0000 369.2458 367.0565 `silica` 20.0000 364.0844 229.7508 2 A(1) -209.7508 414.3396 Refl 3 -83.4955 CX -75.5672 CC -15.0000 97.0160 79.4269 `silica` -11.6150 Aperture Stop 72.1226 4 A(2) 11.6150 72.1226 Refl 5 -75.5672 CC -83.4955 CX 15.0000 77.0143 93.4487 `silica` 407.8622 6 A(3) -635.1022 691.6152 Refl 7 A(4) 635.1022 1006.3416 Refl 131.7841 -62.2903 177.7085 134.7903 8 A(5) -134.7903 89.6331 Refl 9 A(6) 134.7903 223.8931 Refl 10 A(7) A(8) 17.5000 88.9023 73.3478 `silica` Image Distance = 10.0000 IMAGE INF 62.0953 __________________________________________________________________________
• wherein the aspheric constants are given by the following equation and Table 3A ##EQU6##
• TABLE 3A __________________________________________________________________________ K A B C D Aspheric Curv E F G H J __________________________________________________________________________ A(1) -0.00204511 0.000000 2.33031E - 10 -2.45108E - 16 1.19279E - 20 7.03022E - 26 0.00000E + 00 0.00000E + 00 0.00000E + 00 0.00000E + 00 0.00000E + 00 A(2) -0.00552141 0.000000 -3.13911E - 09 5.79100E - 12 -7.42414E - 16 1.18359E - 18 -2.35686E - 22 0.00000E + 00 0.00000E + 00 0.00000E + 00 0.00000E + 00 A(3) -0.00053739 0.000000 1.97475E - 10 -1.92949E - 16 -1.05508E - 21 3.23255E - 27 0.00000E + 00 0.00000E + 00 0.00000E + 00 0.00000E + 00 0.00000E + 00 A(4) 0.00101984 0.000000 -1.51028E - 11 -2.24413E - 18 -3.43794E - 23 -1.20284E - 28 0.00000E + 00 0.00000E + 00 0.00000E + 00 0.00000E + 00 0.00000E + 00 A(5) 0.00387779 0.000000 1.19897E - 07 1.63739E - 11 1.80437E - 15 -5.45296E - 19 2.19063E - 22 -2.90311E - 26 0.00000E + 00 0.00000E + 00 0.00000E + 00 A(6) 0.00571450 0.000000 2.26163E - 09 8.71431E - 14 5.66545E - 19 3.51393E - 22 -1.62403E - 26 7.29705E - 31 0.00000E + 00 0.00000E + 00 0.00000E + 00 A(7) 0.00387779 0.000000 1.19897E - 07 1.63739E - 11 1.80437E - 15 -5.46296E - 19 2.19063E - 22 -2.90311E - 26 0.00000E + 00 0.00000E + 00 0.00000E + 00 A(8) 0.00280709 0.000000 -2.73857E - 08 3.40519E - 10 -6.15022E - 14 -1.29049E - 17 0.00000E + 00 0.00000E + 00 0.00000E + 00 0.00000E + 00 0.00000E + 00 __________________________________________________________________________

An optical reduction system having a long conjugate end and a short conjugate end and an optical axis for use in photolithography comprising:

• a first concave mirror having a first extended curvature;
• a second mirror having a first curvature;
• a third concave mirror having a second extended curvature;
• a fourth concave mirror having a third extended curvature;
• a fifth convex mirror having a second curvature;
• and
• a sixth concave mirror having a third curvature,
• wherein said first concave mirror, said second mirror, said third concave mirror, said fourth concave mirror, said fifth convex mirror, and said sixth concave mirror are all positioned between a first plane formed by the long conjugate end and a second plane formed by the short conjugate end such that when the first and second planes are extended they do not intersect any electromagnetic radiation reflected between said first concave mirror, said second mirror, said third concave mirror, said fourth concave mirror, said fifth convex mirror, and said sixth concave mirror, and the first, second, and third extended curvatures and the first, second, and third curvatures all intersect the optical axis between the first and second planes,
• whereby the long conjugate end and the short conjugate end are accessible for parallel scanning.