G03F 7/70008
Production of exposure light, i.e. light sources
Official title: {Production of exposure light, i.e. light sources}
G03F7/70008 (Production of exposure light, i.e. light sources) appears on 2,386 US grants and 2,911 published applications in this corpus.
Search patents in G03F- Granted patents
- 2,386
- Published applications
- 2,911
- Assignees
- 457
- Inventors
- 4,325
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 6 | 0 |
| 1981 | 3 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 4 | 0 |
| 1985 | 5 | 0 |
| 1986 | 6 | 0 |
| 1987 | 9 | 0 |
| 1988 | 7 | 0 |
| 1989 | 12 | 0 |
| 1990 | 9 | 0 |
| 1991 | 14 | 0 |
| 1992 | 16 | 0 |
| 1993 | 7 | 0 |
| 1994 | 6 | 0 |
| 1995 | 10 | 0 |
| 1996 | 17 | 0 |
| 1997 | 18 | 0 |
| 1998 | 22 | 0 |
| 1999 | 31 | 0 |
| 2000 | 35 | 0 |
| 2001 | 46 | 23 |
| 2002 | 57 | 99 |
| 2003 | 74 | 55 |
| 2004 | 76 | 66 |
| 2005 | 41 | 73 |
| 2006 | 72 | 79 |
| 2007 | 66 | 56 |
| 2008 | 45 | 70 |
| 2009 | 26 | 58 |
| 2010 | 59 | 79 |
| 2011 | 39 | 55 |
| 2012 | 50 | 55 |
| 2013 | 55 | 58 |
| 2014 | 65 | 61 |
| 2015 | 50 | 64 |
| 2016 | 70 | 91 |
| 2017 | 80 | 76 |
| 2018 | 94 | 125 |
| 2019 | 122 | 133 |
| 2020 | 137 | 189 |
| 2021 | 145 | 163 |
| 2022 | 159 | 197 |
| 2023 | 125 | 187 |
| 2024 | 129 | 208 |
| 2025 | 143 | 304 |
| 2026 | 120 | 287 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Optical system and method for a radiation source6 Oct 2026US 12,757,311 B2ASML Netherlands B. V.
- Extreme ultraviolet light source device6 Oct 2026US 12,757,312 B2Samsung Electronics Co., Ltd.
- System and method for monitoring and controlling extreme ultraviolet photolithography processes29 Sep 2026US 12,748,353 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Extreme ultraviolet light generation apparatus and electronic device manufacturing method29 Sep 2026US 12,750,939 B2Gigaphoton Inc.
- Prolonging optical element lifetime in an EUV lithography system22 Sep 2026US 12,743,021 B2ASML Netherlands B. V.
- Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming process8 Oct 2026US 2026/0310075 A1Shin-Etsu Chemical Co., Ltd.
- Lithography system and methods8 Oct 2026US 2026/0310087 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method and apparatus for mitigating tin debris8 Oct 2026US 2026/0310088 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Semiconductor devices and methods of formation8 Oct 2026US 2026/0310095 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method for stitching lines8 Oct 2026US 2026/0310096 A1Tokyo Electron Limited
Most cited
By later US patents
- EUV photopatterning of vapor-deposited metal oxide-containing hardmasks405US 9,996,004 B2Lam Research Corporation · 2018
- Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source260US 7,196,342 B2Cymer, Inc. · 2007
- Ultraviolet laser apparatus and exposure apparatus using same250US 7,023,610 B2Nikon Corporation · 2006
- Scanning light exposure apparatus249US 5,579,147 ANikon Corporation · 1996
- Pattern generator using EUV240US 6,687,041 B1Micronic Laser Systems AB · 2004