G03F 7/70033
By plasma extreme ultraviolet [euv] sources
Official title: {by plasma extreme ultraviolet [EUV] sources}
G03F7/70033 (By plasma extreme ultraviolet [euv] sources) appears on 1,356 US grants and 1,867 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,356
- Published applications
- 1,867
- Assignees
- 209
- Inventors
- 2,661
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 3 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 2 | 0 |
| 1986 | 4 | 0 |
| 1987 | 4 | 0 |
| 1988 | 3 | 0 |
| 1989 | 6 | 0 |
| 1990 | 4 | 0 |
| 1991 | 7 | 0 |
| 1992 | 6 | 0 |
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 4 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 3 | 0 |
| 2000 | 8 | 0 |
| 2001 | 9 | 5 |
| 2002 | 13 | 21 |
| 2003 | 21 | 16 |
| 2004 | 22 | 25 |
| 2005 | 16 | 25 |
| 2006 | 25 | 32 |
| 2007 | 28 | 29 |
| 2008 | 24 | 31 |
| 2009 | 16 | 28 |
| 2010 | 24 | 53 |
| 2011 | 23 | 43 |
| 2012 | 29 | 38 |
| 2013 | 42 | 45 |
| 2014 | 46 | 46 |
| 2015 | 39 | 46 |
| 2016 | 53 | 61 |
| 2017 | 54 | 50 |
| 2018 | 57 | 68 |
| 2019 | 74 | 90 |
| 2020 | 101 | 138 |
| 2021 | 108 | 111 |
| 2022 | 116 | 139 |
| 2023 | 90 | 136 |
| 2024 | 89 | 144 |
| 2025 | 92 | 228 |
| 2026 | 80 | 219 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Optical system and method for a radiation source6 Oct 2026US 12,757,311 B2ASML Netherlands B. V.
- Extreme ultraviolet light source device6 Oct 2026US 12,757,312 B2Samsung Electronics Co., Ltd.
- System and method for monitoring and controlling extreme ultraviolet photolithography processes29 Sep 2026US 12,748,353 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Extreme ultraviolet light generation apparatus and electronic device manufacturing method29 Sep 2026US 12,750,939 B2Gigaphoton Inc.
- Prolonging optical element lifetime in an EUV lithography system22 Sep 2026US 12,743,021 B2ASML Netherlands B. V.
- Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming process8 Oct 2026US 2026/0310075 A1Shin-Etsu Chemical Co., Ltd.
- Lithography system and methods8 Oct 2026US 2026/0310087 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method and apparatus for mitigating tin debris8 Oct 2026US 2026/0310088 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Semiconductor devices and methods of formation8 Oct 2026US 2026/0310095 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method for stitching lines8 Oct 2026US 2026/0310096 A1Tokyo Electron Limited
Most cited
By later US patents
- EUV photopatterning of vapor-deposited metal oxide-containing hardmasks405US 9,996,004 B2Lam Research Corporation · 2018
- Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source260US 7,196,342 B2Cymer, Inc. · 2007
- Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications210US 6,031,241 AUniversity of Central Florida · 2000
- Collector in an extreme ultraviolet lithography system with optimal air curtain protection151US 9,869,934 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2018
- Maskless, microlens EUV lithography system148US 6,498,685 B12002