Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications

A method of operating a capillary discharge source in the approximately 11 to approximately 14 nm wavelength region comprising the steps of:

• (a) forming a discharge across a capillary source having a bore size of approximately 0.5 to approximately 3 mm, and at least one radiating gas, with a discharge current density of up to approximately 1,300,000 Amperes/cm.sup.2 ;
• and
• (b) radiating selected wavelength regions between approximately 11 to approximately 14 nm from the discharge source.

A method of pre-processing a capillary discharge source having an optical element that operates in the ultraviolet region, prior to operating the source, in order to prevent rupturing of the optical element or contaminating mirrors that receive radiation, comprising the steps of:

• pre-conditioning interior bore surface walls of a capillary discharge source that operates in the ultraviolet region;
• and
• continuing the pre-conditioning until a selected impulse value is reached.

A capillary discharge lamp source operating in the ultraviolet wavelength region, comprising:

• a capillary constructed from a nonconducting and an insulating material;
• and
• at least one gaseous species inserted in the capillary, wherein the capillary is used to generate ultraviolet discharges.