Extreme ultraviolet light generation apparatus and electronic device manufacturing method

An electronic device manufacturing method, comprising:

• generating extreme ultraviolet light using an extreme ultraviolet light generation apparatus;
• outputting extreme ultraviolet light to an exposure apparatus;
• and
• exposing a photosensitive substrate to the extreme ultraviolet light in the exposure apparatus to manufacture an electronic device,
• the extreme ultraviolet light generation apparatus including:
• a chamber including a first space in which a target is irradiated with laser light to generate the extreme ultraviolet light, and a second space in which an EUV light concentrating mirror that reflects and outputs the extreme ultraviolet light to the exposure apparatus is arranged;
• a first partition wall including a first opening through which the extreme ultraviolet light passes and located between the first space and the second space;
• a connection portion which connects the chamber and the exposure apparatus;
• a second partition wall including a second opening through which the extreme ultraviolet light passes and located inside the connection portion;
• a gas supply port which allows a gas, to be supplied to the second space, to pass therethrough;
• a first exhaust port which opens to the first space;
• a second exhaust port which opens to a third space located inside the connection portion and between the second partition wall and the exposure apparatus;
• a sensor arranged in the third space;
• and
• a processor configured to calculate a first passage flow rate of a gas passing through the first opening based on a measurement result of the sensor and adjust a supply flow rate of the gas to be supplied through the gas supply port based on the first passage flow rate.

An electronic device manufacturing method, comprising:

• inspecting a defect of a mask by irradiating the mask in an inspection apparatus with extreme ultraviolet light generated by an extreme ultraviolet light generation apparatus;
• selecting a mask using a result of the inspection;
• and
• exposing and transferring a pattern formed on the selected mask onto a photosensitive substrate,
• the extreme ultraviolet generation apparatus including:
• a chamber including a first space in which a target is irradiated with laser light to generate the extreme ultraviolet light, and a second space in which an EUV light concentrating mirror that reflects and outputs the extreme ultraviolet light to the inspection apparatus is arranged;
• a first partition wall including a first opening through which the extreme ultraviolet light passes and located between the first space and the second space;
• a connection portion which connects the chamber and the inspection apparatus;
• a second partition wall including a second opening through which the extreme ultraviolet light passes and located inside the connection portion;
• a gas supply port which allows a gas, to be supplied to the second space, to pass therethrough;
• a first exhaust port which opens to the first space;
• a second exhaust port which opens to a third space located inside the connection portion and between the second partition wall and the inspection apparatus;
• a sensor arranged in the third space;
• and
• a processor configured to calculate a first passage flow rate of a gas passing through the first opening based on a measurement result of the sensor and adjust a supply flow rate of the gas to be supplied through the gas supply port based on the first passage flow rate.