G03F 7/70016
By discharge lamps
Official title: {by discharge lamps}
G03F7/70016 (By discharge lamps) appears on 156 US grants and 75 published applications in this corpus.
Search patents in G03F- Granted patents
- 156
- Published applications
- 75
- Assignees
- 72
- Inventors
- 249
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 2 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 3 | 0 |
| 1985 | 2 | 0 |
| 1986 | 2 | 0 |
| 1987 | 5 | 0 |
| 1988 | 2 | 0 |
| 1989 | 3 | 0 |
| 1990 | 2 | 0 |
| 1991 | 4 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 3 | 0 |
| 1996 | 4 | 0 |
| 1997 | 9 | 0 |
| 1998 | 11 | 0 |
| 1999 | 7 | 0 |
| 2000 | 9 | 0 |
| 2001 | 6 | 1 |
| 2002 | 9 | 10 |
| 2003 | 7 | 6 |
| 2004 | 8 | 2 |
| 2005 | 2 | 2 |
| 2006 | 4 | 2 |
| 2007 | 0 | 0 |
| 2008 | 0 | 3 |
| 2009 | 1 | 0 |
| 2010 | 1 | 2 |
| 2011 | 1 | 0 |
| 2012 | 1 | 1 |
| 2013 | 2 | 0 |
| 2014 | 1 | 2 |
| 2015 | 0 | 0 |
| 2016 | 2 | 5 |
| 2017 | 2 | 2 |
| 2018 | 6 | 3 |
| 2019 | 4 | 6 |
| 2020 | 4 | 7 |
| 2021 | 4 | 5 |
| 2022 | 6 | 5 |
| 2023 | 4 | 5 |
| 2024 | 3 | 2 |
| 2025 | 2 | 3 |
| 2026 | 3 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Light source apparatus, lithography apparatus, and article manufacturing method25 Aug 2026US 12,717,240 B2Canon Kabushiki Kaisha
- Method and apparatus for greyscale lithography28 Apr 2026US 12,613,469 B2APPLIED Materials.Inc.
- Predictive calibration scheduling apparatus and method3 Feb 2026US 12,540,850 B2Cymer, Inc.
- Light source apparatus, lithography apparatus, and article manufacturing20 May 2025US 12,306,387 B2Canon Kabushiki Kaisha
- Charged particle source module29 Apr 2025US 12,288,663 B2ASML Netherlands B. V.
- Illumination optical system including temperature compensated aperture30 Apr 2026US 2026/0118621 A1Samsung Display Co., Ltd.
- System, apparatus and method for selective surface treatment23 Oct 2025US 2025/0328084 A1ASML Netherlands B. V.
- Substarate processing apparatus with vuv intensity control31 Jul 2025US 2025/0244684 A1ASM IP Holding B. V.
- Photoresist composition and method of manufacturing integrated circuit device using the same8 May 2025US 2025/0149336 A1Samsung Electronics Co., Ltd.
- Illumination optical system, exposure apparatus, irradiation method, and component manufacturing method5 Dec 2024US 2024/0402610 A1Ushio Denki Kabushiki Kaisha
Most cited
By later US patents
- Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications210US 6,031,241 AUniversity of Central Florida · 2000
- Xenon short arc discharge lamp109US 4,937,496 AW. C. Heraeus GmbH · 1990
- Lamp including sulfur105US 5,404,076 AFusion Systems Corporation · 1995
- Microdischarge lamp and array73US 6,194,833 B1The Board of Trustees of the University of Illinois · 2001
- Excimer lamp with high pressure fill58US 5,686,793 AFusion UV Systems, Inc. · 1997