Light source apparatus, lithography apparatus, and article manufacturing
AssigneeCanon Kabushiki Kaisha
InventorTakayuki Yamaguchi
Life of this patent
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Abstract
A light source apparatus configured to emit light includes a condenser unit configured to reflect light from a light source and to condense the light on a condensing point, a light shielding unit disposed on an optical path of the light from the condenser unit, and a reflector unit disposed between the condenser unit and the light shielding unit and configured to reflect the light from the condenser unit. The reflector unit is disposed so that reflected light is condensed by the condenser unit toward the condensing point.
Claims16
A light source apparatus configured to emit light, the light source apparatus comprising:
- a condenser unit configured to reflect light from a light source and to condense the light on a condensing point;
- a light shielding unit disposed on an optical path of the light from the condenser unit;
- and
- a reflector unit disposed between the condenser unit and the light shielding unit and configured to reflect the light from the condenser unit,
- wherein the reflector unit is disposed so that reflected light is condensed by the condenser unit toward the condensing point.
A lithography apparatus configured to form a pattern on a substrate, the lithography apparatus comprising a light source apparatus,
- wherein the light source apparatus includes:
- a condenser unit configured to reflect light from a light source and to condense the light on a condensing point;
- a light shielding unit disposed on an optical path of the light from the condenser unit;
- and
- a reflector unit disposed between the condenser unit and the light shielding unit and configured to reflect the light from the condenser unit,
- wherein the reflector unit is disposed so that reflected light is condensed by the condenser unit toward the condensing point.
An article manufacturing method comprising the steps of:
- forming a pattern on a substrate using a lithography apparatus configured to form a pattern on the substrate, the lithography apparatus comprising a light source apparatus that includes a condenser unit configured to reflect light from a light source and to condense the light on a condensing point, a light shielding unit disposed on an optical path of the light from the condenser unit, and a reflector unit disposed between the condenser unit and the light shielding unit and configured to reflect the light from the condenser unit, wherein the reflector unit is disposed so that reflected light is condensed by the condenser unit toward the condensing point;
- and
- manufacturing an article from the substrate on which the pattern has been formed.
Dependencies are inferred from the claim text.