G03F 7/7005
By multiple sources
Official title: {by multiple sources, e.g. light-emitting diodes [LED] or light source arrays (addressable array sources specially adapted to produce patterns without a mask G03F7/70391)}
G03F7/7005 (By multiple sources) appears on 188 US grants and 215 published applications in this corpus.
Search patents in G03F- Granted patents
- 188
- Published applications
- 215
- Assignees
- 104
- Inventors
- 450
- Latest grant
- 21 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 2 | 0 |
| 1997 | 3 | 0 |
| 1998 | 5 | 0 |
| 1999 | 7 | 0 |
| 2000 | 5 | 0 |
| 2001 | 4 | 4 |
| 2002 | 1 | 5 |
| 2003 | 6 | 6 |
| 2004 | 2 | 12 |
| 2005 | 6 | 20 |
| 2006 | 16 | 14 |
| 2007 | 14 | 8 |
| 2008 | 6 | 7 |
| 2009 | 0 | 7 |
| 2010 | 9 | 12 |
| 2011 | 2 | 3 |
| 2012 | 6 | 7 |
| 2013 | 4 | 3 |
| 2014 | 4 | 5 |
| 2015 | 3 | 5 |
| 2016 | 3 | 7 |
| 2017 | 4 | 4 |
| 2018 | 7 | 14 |
| 2019 | 13 | 6 |
| 2020 | 9 | 11 |
| 2021 | 10 | 10 |
| 2022 | 5 | 8 |
| 2023 | 6 | 8 |
| 2024 | 7 | 10 |
| 2025 | 8 | 14 |
| 2026 | 5 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Correction method of multi-beam exposure device21 Jul 2026US 12,687,789 B2Samsung Display Co., Ltd.
- Exposure apparatus9 Jun 2026US 12,650,651 B2Contemporary Amperex Technology (Hong Kong) Limited
- Method and apparatus for greyscale lithography28 Apr 2026US 12,613,469 B2APPLIED Materials.Inc.
- Geometric loading effect correction for lithography10 Mar 2026US 12,572,082 B1D2S, Inc.
- EUV light generation apparatus and electronic device manufacturing method17 Feb 2026US 12,554,202 B2Gigaphoton Inc.
- Short-wave systems and methods and suitable targets thereof10 Sep 2026US 2026/0267230 A1L2X-Labs Ltd
- Illumination optical system including temperature compensated aperture30 Apr 2026US 2026/0118621 A1Samsung Display Co., Ltd.
- Light source apparatus, exposure apparatus, and article manufacturing method5 Mar 2026US 2026/0064019 A1Canon Kabushiki Kaisha
- Euv light source having a combination device12 Feb 2026US 2026/0046995 A1TRUMPF Lasersystems for Semiconductor Manufacturing GmbH
- Duv led array for an ultraviolet-ozone cleaning system1 Jan 2026US 2026/0003291 A1
Most cited
By later US patents
- Scanning light exposure apparatus249US 5,579,147 ANikon Corporation · 1996
- High efficiency solid-state light source and methods of use and manufacture122US 8,192,053 B2Phoseon Technology, Inc. · 2012
- Imaging method for manufacture of microdevices85US 5,305,054 ACanon Kabushiki Kaisha · 1994
- Image farming and microdevice manufacturing method and exposure apparatus in which a light source includes four quadrants of predetermined intensity70US 5,673,102 ACanon Kabushiki Kaisha · 1997
- Illumination optical system43US 5,091,744 ACanon Kabushiki Kaisha · 1992