Imaging method for manufacture of microdevices
AssigneeCanon Kabushiki Kaisha
InventorsAkiyoshi Suzuki, Miyoko Noguchi
Life of this patent
Estimating the term…
Abstract
An imaging method for imaging a fine pattern having linear features extending along orthogonal first and second directions is disclosed, which method is characterized by: providing a light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively; and illuminating the pattern with light from the light source.
Claims59
An imaging method for imaging a fine pattern having linear features extending along orthogonal first and second directions, said method comprising:
- providing a light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively;
- and
- illuminating the pattern with light from the light source.
A device for forming an image of a fine pattern having linear features extending in orthogonal first and second directions, said device comprising:
- a primary light source;
- an illumination optical system for illuminating the pattern, said illumination optical system having means for forming, with light from said primary light source, a secondary light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively;
- and
- a projection optical system for projecting, on a predetermined plane, an image of the pattern illuminated with light from said secondary light source.
In a microdevice manufacturing method including a step for imaging on a workpiece a fine pattern having linear features extending along orthogonal first and second directions to print the fine pattern on the workpiece, the improvements comprising:
- providing a light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively;
- and
- illuminating the pattern with light from the light source.
A microdevice manufacturing projection exposure apparatus for projecting an image of a pattern of an original on a workpiece, said apparatus comprising:
- an X-Y stage for supporting thereon the workpiece and being movable along X and Y directions in an X-Y coordinate system defined in said apparatus;
- means for forming, with light from a primary light source, a secondary light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the X and Y directions, respectively;
- a condensing optical system for illuminating the pattern of the original with light from said secondary light source;
- and
- a projection optical system for projecting on the workpiece an image of the pattern illuminated with the light from said secondary light source.
A microdevice manufacturing projection exposure apparatus for projecting an image of a pattern of an original on a workpiece, said apparatus comprising:
- an X-Y stage for supporting thereon the workpiece and being movable along X and Y directions in an X-Y coordinate system defined in said apparatus;
- means for selectively forming, with light from a primary light source, different secondary light sources of different light intensity distributions including a particular secondary light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the X and Y directions, respectively;
- a condensing optical system for illuminating the pattern of the original with light from a secondary light source selectively formed by said selectively forming means;
- and
- a projection optical system for projecting an image of the illuminated pattern on the workpiece.
In a method of imaging a fine pattern having linear features extending in orthogonal first and second directions, wherein the pattern is illuminated with light obliquely with respect to the pattern, the improvements residing in that:
- the strength of illumination of the pattern in a first plane of incidence including the first direction and the strength of illumination of the pattern in a second plane of incidence including the second direction are made lower than that in a third plane of incidence other than the first and second planes.
In a method of manufacturing microdevices wherein a fine pattern having linear features extending in orthogonal first and second directions is illuminated with light obliquely with respect to the pattern and wherein the illuminated pattern is imaged and printed on a workpiece, the improvements residing in that:
- the strength of illumination in a predetermined plane of incidence is made greater than that in a first plane of incidence including the first direction and that in a second plane of incidence including the second direction and intersecting with the first plane of incidence perpendicularly.
In a method of imaging a fine pattern having linear features each extending in a predetermined direction, wherein the pattern is illuminated with light obliquely with respect to the pattern, the improvements residing in that:
- the illumination of the pattern with light along a path in a plane of incidence including the predetermined direction is substantially blocked;
- and
- the pattern is illuminated with light along a pair of paths which are symmetrical with each other with respect to the plane of incidence.
In a method of manufacturing microdevices wherein a fine pattern having linear features each extending in a predetermined direction is illuminated with light obliquely with respect to the pattern and wherein the illuminated pattern is imaged and printed on a workpiece, the improvements residing in that:
- the illumination of the pattern with light along a path in a plane of incidence including the predetermined direction is substantially blocked;
- and
- the pattern is illuminated with light along a pair of paths which are symmetrical with each other with respect to the plane of incidence.
A projection exposure apparatus for projecting on a workpiece an image of an original having a pattern of linear features, said apparatus comprising:
- an X-Y stage for supporting thereon the workpiece and being movable along X and Y directions in an X-Y coordinate system defined in said apparatus;
- means for illuminating the mask with light obliquely with respect to the mask, wherein each beam component of the light in a first plane of incidence including the X direction and a beam component of the light in a second plane of incidence including the Y direction and intersecting with the first plane of incidence perpendicularly, has a strength made lower than that of a beam component of light in a third plane of incidence other than the first and second planes;
- and
- a projection optical system for projecting on the workpiece an image of the pattern of the mask illuminated by said illuminating means.
A projection exposure apparatus for projecting on a workpiece an image of an original having a grating pattern, said apparatus comprising:
- an X-Y stage for supporting thereon the workpiece and being movable along X and Y directions in an X-Y coordinate system defined in said apparatus;
- means for illuminating the pattern of the mask with light obliquely with respect to the pattern and along a pair of paths which are symmetric with each other with respect to a predetermined plane of incidence including the X direction, while substantially blocking the illumination of the pattern along a path in the predetermined plane of incidence;
- and
- a projection optical system for projecting on the workpiece an image of the pattern of the mask illuminated by said illuminating means.
An illumination method in image projection, for illuminating a fine pattern of an original, characterized by:
- providing a light intensity distribution having decreased intensity portions at a center thereof and on first and second orthogonal axes with respect to which the original is to be placed.
An illumination method in image projection, for obliquely illuminating with light a fine pattern of an original placed with reference to first and second orthogonal axes, characterized in that:
- the strength of illumination of the pattern in a first plane of incidence including the first axis and the strength of illumination of the pattern in a second plane of incidence including the second axis are made lower than that in a third plane of incidence other than the first and second planes.
Dependencies are inferred from the claim text.