Correction method of multi-beam exposure device

A correction method of a multi-beam exposure device, the correction method comprising:

• generating a first function that is a relational expression between a gray level of an edge beam among a plurality of beams and a variation amount in a size of a pattern according to a second beam adjacent to the edge beam;
• obtaining a second function that is a relational expression between the first function, the gray level of the edge beam, and a variation amount in a deviation amount of a CD (critical dimension) and the deviation amount of the CD according to each of the plurality of beams;
• generating a matrix equation by calculating a sum of a plurality of second functions including the second function taken over all multi-beam combinations in which the plurality of beams are differently combined;
• deriving a solution of the matrix equation by measuring the deviation amount of the CD;
• deriving an optimal dose amount of each of the plurality of beams by using the solution of the matrix equation;
• and
• correcting a dose amount of each of the plurality of beams of the multi-beam exposure device individually by using the optimal dose amount of each of the plurality of beams.