G03F 7/70041
By pulsed sources
Official title: {by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control}
G03F7/70041 (By pulsed sources) appears on 367 US grants and 404 published applications in this corpus.
Search patents in G03F- Granted patents
- 367
- Published applications
- 404
- Assignees
- 72
- Inventors
- 586
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1989 | 2 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 12 | 0 |
| 2000 | 9 | 0 |
| 2001 | 14 | 4 |
| 2002 | 18 | 47 |
| 2003 | 32 | 19 |
| 2004 | 30 | 20 |
| 2005 | 9 | 22 |
| 2006 | 24 | 31 |
| 2007 | 18 | 12 |
| 2008 | 13 | 24 |
| 2009 | 10 | 14 |
| 2010 | 19 | 10 |
| 2011 | 7 | 3 |
| 2012 | 7 | 2 |
| 2013 | 2 | 4 |
| 2014 | 5 | 3 |
| 2015 | 1 | 7 |
| 2016 | 4 | 9 |
| 2017 | 10 | 8 |
| 2018 | 16 | 17 |
| 2019 | 11 | 8 |
| 2020 | 6 | 14 |
| 2021 | 8 | 15 |
| 2022 | 13 | 23 |
| 2023 | 11 | 17 |
| 2024 | 18 | 24 |
| 2025 | 18 | 23 |
| 2026 | 12 | 24 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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Most cited
By later US patents
- Pattern generator using EUV240US 6,687,041 B1Micronic Laser Systems AB · 2004
- Pattern generator236US 6,747,783 B1Micronic Laser Systems AB · 2004
- Laser system and method for processing a memory link with a burst of laser pulses having ultrashort pulse widths202US 6,574,250 B2Electro Scientific Industries, Inc. · 2003
- Maskless, reticle-free, lithography172US 5,691,541 AThe Regents of the University of California · 1997
- Reliable modular production quality narrow-band high REP rate excimer laser171US 6,128,323 ACymer, Inc. · 2000