Pattern generator
AssigneeMicronic Laser Systems AB
InventorTorbjorn Sandstrom
Life of this patent
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Abstract
An apparatus is provided for creating a pattern on a workpiece sensitive to radiation, such as a photomask, a display panel or a microoptical device. The apparatus includes a radiation source and a spatial modulator (SLM) having a multitude of modulating elements (pixels). It further includes an electronic data processing and delivery system feeding drive signals to the modulator, a precision mechanical system for moving said workpiece and an electronic control system coordinating the movement of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is stitched together from the partial images created by the sequence of partial patterns. The drive signals can set a modulating element to a number of states larger than two.
Claims49
An apparatus for creating a pattern on a workpiece sensitive to light radiation, comprising
- a source for emitting light in the wavelength range from EUV to IR,
- a spatial light modulator (SLM) having a multitude of modulating elements (pixels), adapted to being illuminated by said radiation
- a projection system creating an image of the modulator on the workpiece,
- an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting said pattern to modulator signals, and feeding said signals to the modulator,
- a precision mechanical system for positioning at least one of said workpiece and said projection system relative to each other,
- an electronic control system controlling the position of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is printed on the workpiece,
- where the drive signals and the modulating elements are adapted to create a number of modulation states larger than two.
Dependencies are inferred from the claim text.