Prediction apparatus and method for optical source

An ultraviolet (UV) light source comprising:

• a photolithography exposure apparatus configured to receive a substrate;
• an optical source configured to produce a pulsed light beam having a UV wavelength for use by the photolithography exposure apparatus to process the substrate;
• and
• a prediction apparatus in communication with the optical source and the photolithography exposure apparatus, the prediction apparatus configured to:
• receive an identifier, the received identifier lacking data relating to an actual firing pattern defining properties of the pulsed light beam;
• and
• provide a forecast firing pattern associated with the received identifier to the optical source, the forecast firing pattern forecasting a property of the actual firing pattern.

A prediction apparatus in communication with an optical source configured to produce a pulsed light beam for use by a photolithography exposure apparatus, the prediction apparatus comprising:

• a photolithography module in communication with the photolithography exposure apparatus and configured to receive an identifier, the received identifier lacking data relating to an actual firing pattern defining properties of the pulsed light beam;
• a forecast module in communication with the photolithography module and configured to create a forecast firing pattern associated with the received identifier by observing an actual firing pattern of the optical source a plurality of instances after receipt of the identifier;
• and
• an optical source module in communication with the optical source, the optical source module configured to provide the forecast firing pattern to the optical source.

A method for operating an optical source in accordance with a reduced operating space relative to a full permitted operating space, the method comprising:

• receiving an identifier from a photolithography exposure apparatus, the received identifier lacking data relating to an actual firing pattern defining properties of a pulsed light beam produced by the optical source;
• and
• providing a forecast firing pattern to the optical source;
• wherein the forecast firing pattern is associated with the received identifier and forecasts the actual firing pattern.