Extreme ultraviolet light generation system and electronic device manufacturing method

An electronic device manufacturing method, comprising:

• generating extreme ultraviolet light using an extreme ultraviolet light generation system;
• outputting the extreme ultraviolet light to an external apparatus which is an exposure apparatus;
• and
• exposing a photosensitive substrate to the extreme ultraviolet light in the exposure apparatus to manufacture an electronic device,
• the extreme ultraviolet light generation system including:
• a chamber;
• a target supply unit configured to supply a target substance to a plasma generation region including a first point in the chamber;
• a window configured to allow pulse laser light with which the target substance is irradiated to pass therethrough;
• an EUV light concentrating mirror configured to concentrate, on a second point, the extreme ultraviolet light generated at the first point;
• a planar mirror arranged on an optical path of the extreme ultraviolet light reflected by the EUV light concentrating mirror and arranged between the first point included in the plasma generation region and the second point;
• an actuator configured to cause the second point to be switched between a first position and a second position by changing a posture of the planar mirror;
• a connection portion configured to be connectable to the external apparatus which the extreme ultraviolet light having passed through the first position enters;
• a first EUV measurement unit on which the extreme ultraviolet light having passed through the second position is incident;
• and
• a processor configured to control the actuator based on a signal from the external apparatus,
• wherein the signal includes an EUV light NG signal indicating that a measurement result of the extreme ultraviolet light at the external apparatus does not satisfy a first condition,
• the processor controls the actuator to move the second point, at which the EUV light is concentrated by the EUV light concentrating mirror, from the first position to the second position when the EUV light NG signal is output from the external apparatus,
• when the processor controls the actuator to set the second point to the first position, the planar mirror reflects the extreme ultraviolet light toward the external apparatus through the first position, and
• when the processor controls the actuator to set the second point to the second position, the planar mirror reflects the extreme ultraviolet light toward the EUV measurement unit.

An electronic device manufacturing method, comprising:

• inspecting a defect of a mask by irradiating the mask in an external apparatus which is an inspection apparatus with extreme ultraviolet light generated by an extreme ultraviolet light generation system;
• selecting a mask using a result of the inspection;
• and
• exposing and transferring a pattern formed on the selected mask onto a photosensitive substrate,
• the extreme ultraviolet light generation system including:
• a chamber;
• a target supply unit configured to supply a target substance to a plasma generation region including a first point in the chamber;
• a window configured to allow pulse laser light with which the target substance is irradiated to pass therethrough;
• an EUV light concentrating mirror configured to concentrate, on a second point, the extreme ultraviolet light generated at the first point;
• a planar mirror arranged on an optical path of the extreme ultraviolet light reflected by the EUV light concentrating mirror and arranged between the first point included in the plasma generation region and the second point;
• an actuator configured to cause the second point to be switched between a first position and a second position by changing a posture of the planar mirror;
• a connection portion configured to be connectable to the external apparatus which the extreme ultraviolet light having passed through the first position enters,
• a first EUV measurement unit on which the extreme ultraviolet light having passed through the second position is incident;
• and
• a processor configured to control the actuator based on a signal from the external apparatus,
• wherein the signal includes an EUV light NG signal indicating that a measurement result of the extreme ultraviolet light at the external apparatus does not satisfy a first condition,
• the processor controls the actuator to move the second point, at which the EUV light is concentrated by the EUV light concentrating mirror, from the first position to the second position when the EUV light NG signal is output from the external apparatus,
• when the processor controls the actuator to set the second point to the first position, the planar mirror reflects the extreme ultraviolet light toward the external apparatus through the first position, and
• when the processor controls the actuator to set the second point to the second position, the planar mirror reflects the extreme ultraviolet light toward the EUV measurement unit.