G03F 7/70058
Mask illumination systems
Official title: {Mask illumination systems}
G03F7/70058 (Mask illumination systems) appears on 4,463 US grants and 4,427 published applications in this corpus.
Search patents in G03F- Granted patents
- 4,463
- Published applications
- 4,427
- Assignees
- 573
- Inventors
- 5,407
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 4 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 4 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 5 | 0 |
| 1984 | 4 | 0 |
| 1985 | 10 | 0 |
| 1986 | 8 | 0 |
| 1987 | 11 | 0 |
| 1988 | 17 | 0 |
| 1989 | 16 | 0 |
| 1990 | 17 | 0 |
| 1991 | 20 | 0 |
| 1992 | 29 | 0 |
| 1993 | 32 | 0 |
| 1994 | 48 | 0 |
| 1995 | 56 | 0 |
| 1996 | 49 | 0 |
| 1997 | 89 | 0 |
| 1998 | 77 | 0 |
| 1999 | 71 | 0 |
| 2000 | 73 | 0 |
| 2001 | 110 | 58 |
| 2002 | 103 | 139 |
| 2003 | 112 | 137 |
| 2004 | 131 | 160 |
| 2005 | 114 | 187 |
| 2006 | 152 | 199 |
| 2007 | 121 | 200 |
| 2008 | 128 | 191 |
| 2009 | 109 | 212 |
| 2010 | 114 | 165 |
| 2011 | 128 | 184 |
| 2012 | 108 | 155 |
| 2013 | 154 | 190 |
| 2014 | 181 | 209 |
| 2015 | 196 | 258 |
| 2016 | 260 | 230 |
| 2017 | 274 | 208 |
| 2018 | 266 | 189 |
| 2019 | 215 | 185 |
| 2020 | 202 | 203 |
| 2021 | 166 | 135 |
| 2022 | 130 | 131 |
| 2023 | 95 | 127 |
| 2024 | 81 | 136 |
| 2025 | 91 | 131 |
| 2026 | 76 | 108 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- G03F 7/70091Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution1,133
- G03F 7/7015Details of optical elements1,075
- G03F 7/70191Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation844
- G03F 7/702Reflective illumination, i.e. reflective optical elements other than folding mirrors617
- G03F 7/70075Homogenization of illumination intensity in the mask plane by using an integrator592
- G03F 7/70125Use of illumination settings tailored to particular mask patterns406
- G03F 7/70066Size and form of the illuminated area in the mask plane383
- G03F 7/70141Illumination system adjustment381
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- Extreme ultraviolet lithography system8 Oct 2026US 2026/0310108 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Optical system, method of use, and method of fabrication1 Oct 2026US 2026/0299429 A1xLight Inc.
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- Illumination apparatus, measurement apparatus, substrate processing apparatus, and method for manufacturing article1 Oct 2026US 2026/0299436 A1Canon Kabushiki Kaisha
Most cited
By later US patents
- Projection exposure apparatus and method which uses multiple diffraction gratings in order to produce a solid state device with fine patterns855US 5,715,039 AHitachi, Ltd. · 1998
- Lithography system employing a solid immersion lens588US 5,121,256 AThe Board of Trustees of the Leland Stanford Junior University · 1992
- Stage device with frame-shaped member movable in at least three degrees of freedom within a two-dimensional plane560US 7,489,389 B2Nikon Corporation · 2009
- Microlens scanner for microlithography and wide-field confocal microscopy461US 6,133,986 A2000
- Systems and methods for improving pattern transfer376US 9,529,268 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2016