G03F 7/70091
Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution
Official title: {Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]}
G03F7/70091 (Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution) appears on 1,133 US grants and 1,155 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,133
- Published applications
- 1,155
- Assignees
- 171
- Inventors
- 1,374
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 3 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 5 | 0 |
| 1993 | 5 | 0 |
| 1994 | 16 | 0 |
| 1995 | 15 | 0 |
| 1996 | 8 | 0 |
| 1997 | 33 | 0 |
| 1998 | 26 | 0 |
| 1999 | 14 | 0 |
| 2000 | 21 | 0 |
| 2001 | 35 | 18 |
| 2002 | 32 | 41 |
| 2003 | 33 | 39 |
| 2004 | 30 | 58 |
| 2005 | 42 | 54 |
| 2006 | 51 | 62 |
| 2007 | 34 | 55 |
| 2008 | 35 | 65 |
| 2009 | 34 | 81 |
| 2010 | 36 | 56 |
| 2011 | 36 | 57 |
| 2012 | 26 | 53 |
| 2013 | 49 | 38 |
| 2014 | 51 | 51 |
| 2015 | 58 | 68 |
| 2016 | 74 | 54 |
| 2017 | 76 | 50 |
| 2018 | 73 | 39 |
| 2019 | 58 | 33 |
| 2020 | 32 | 25 |
| 2021 | 20 | 16 |
| 2022 | 13 | 21 |
| 2023 | 19 | 21 |
| 2024 | 8 | 24 |
| 2025 | 15 | 40 |
| 2026 | 10 | 36 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Methods of patterning a photoresist, and related patterning systems25 Aug 2026US 12,717,239 B2Liteq B.V.
- Microelectromechanical apparatus with heating element18 Aug 2026US 12,710,619 B2Carl Zeiss SMT GmbH
- EUV multi-mirror arrangement30 Jun 2026US 12,669,753 B2Carl Zeiss SMT GmbH
- Systems and methods for forming topological lattices of plasmonic merons16 Jun 2026US 12,656,689 B2The Trustees of Columbia University in the City of New York
- High accuracy temperature-compensated piezoresistive position sensing system2 Jun 2026US 12,645,069 B2ASML Netherlands B. V.
- Operating device and operating method for optical proximity correction8 Oct 2026US 2026/0310093 A1United Microelectronics Corp.
- Illumination apparatus, measurement apparatus, substrate processing apparatus, and method for manufacturing article1 Oct 2026US 2026/0299436 A1Canon Kabushiki Kaisha
- Optical system for a projection exposure apparatus, and method for specifying an illumination pupil13 Aug 2026US 2026/0235866 A1
- Measurement system, measurement method with the aid of such a measurement system, and projection exposure apparatus comprising such a measurement system6 Aug 2026US 2026/0227714 A1
- Lithographic apparatus, method of increasing plasma concentration, and method of manufacturing devices6 Aug 2026US 2026/0231313 A1ASML Netherlands B. V.
Most cited
By later US patents
- Microlens scanner for microlithography and wide-field confocal microscopy461US 6,133,986 A2000
- Illuminating arrangement including a zoom objective incorporating two axicons158US 5,675,401 ACarl-Zeiss-Stiftung · 1997
- Illumination device including amplitude-division and beam movements157US 5,153,773 ACanon Kabushiki Kaisha · 1992
- Illumination system and exposure apparatus having the same154US 6,259,512 B1Canon Kabushiki Kaisha · 2001
- Maskless lithography138US 5,870,176 ASandia Corporation · 1999