G03F 7/701
Off-axis setting using an aperture
Official title: {Off-axis setting using an aperture}
G03F7/701 (Off-axis setting using an aperture) appears on 251 US grants and 185 published applications in this corpus.
Search patents in G03F- Granted patents
- 251
- Published applications
- 185
- Assignees
- 56
- Inventors
- 307
- Latest grant
- 5 Jul 2022
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 8 | 0 |
| 1995 | 9 | 0 |
| 1996 | 5 | 0 |
| 1997 | 19 | 0 |
| 1998 | 15 | 0 |
| 1999 | 9 | 0 |
| 2000 | 9 | 0 |
| 2001 | 11 | 10 |
| 2002 | 13 | 19 |
| 2003 | 14 | 8 |
| 2004 | 6 | 20 |
| 2005 | 10 | 17 |
| 2006 | 18 | 17 |
| 2007 | 9 | 11 |
| 2008 | 11 | 13 |
| 2009 | 9 | 13 |
| 2010 | 3 | 5 |
| 2011 | 8 | 5 |
| 2012 | 1 | 6 |
| 2013 | 2 | 7 |
| 2014 | 12 | 4 |
| 2015 | 5 | 5 |
| 2016 | 8 | 2 |
| 2017 | 15 | 6 |
| 2018 | 8 | 6 |
| 2019 | 8 | 3 |
| 2020 | 0 | 2 |
| 2021 | 2 | 2 |
| 2022 | 1 | 0 |
| 2023 | 0 | 0 |
| 2024 | 0 | 2 |
| 2025 | 0 | 0 |
| 2026 | 0 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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Most cited
By later US patents
- Method for reticle inspection using aerial imaging131US 6,268,093 B1APPLIED Materials.Inc. · 2001
- Exposure apparatus and exposure method capable of controlling illumination distribution121US 6,771,350 B2Nikon Corporation · 2004
- Lithography apparatus114US 6,452,662 B2ASML Netherlands B. V. · 2002
- Projection exposure apparatus110US 5,677,757 ANikon Corporation · 1997
- Method and system for optimizing illumination in an optical photolithography projection imaging system102US 5,680,588 AInternational Business Machines Corporation · 1997