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US 11,061,334 B2Granted
Pupil facet mirror, illumination optics and optical system for a projection lithography system
AssigneeCarl Zeiss SMT GmbH
InventorMarkus Deguenther
Life of this patent
Estimating the term…
Abstract
In an optical system for a projection exposure apparatus, the angle space of the illumination radiation of the projection optical unit at the reticle is twice as large in a first direction as the angle space of the illuminating radiation of the illuminating optical unit.
Claims25
An optical system, comprising:
- an illumination optical unit;
- and
- a projection optical unit having an object field and an image field,
- wherein:
- the illumination optical unit is configured to transfer illumination radiation to the object field;
- the projection optical unit is configured to project a reticle in the object field to a light-sensitive material in the image field;
- for illumination radiation that exits the illumination optical unit and impinges on the reticle, the illumination radiation has a first range of angles in a first direction;
- for illumination radiation that is reflected by the reticle, passes through the projection optical unit and impinges on the light-sensitive material, the illumination radiation has a second range of angles in the first direction;
- and
- the second range of angles in the first direction is twice as large as the first range of angles in the first direction.
7 more elements
Dependencies are inferred from the claim text.