Back to results
US 6,452,662 B2Granted
Lithography apparatus
AssigneeASML Netherlands B.V.
InventorsJohannesq Catharinus Hubertus Mulkens, Gavin Charles Rider, Jan Wietse Ricolt Ten Cate
Life of this patent
Estimating the term…
Abstract
An illumination system for a microlithographic exposure apparatus comprised of an adjustable axicon, a variable zoom element, and a multipole illumination mode generating element. By controlling the optical components, the illumination mode can be varied continuously between conventional, annular, and multipole.
Claims28
A lithography apparatus, comprising:
- a radiation system constructed and arranged to supply a beam of radiation;
- a first object table arranged to intercept radiation from said beam of radiation and adapted to hold a mask,
- a second object table arranged to intercept radiation from said beam of radiation after passing said object table and adapted to hold a substrate,
- a projection system constructed and arranged to image an irradiated portion of the mask onto a target portion of the substrate,
- wherein said radiation system comprises an illumination system which comprises:
- an adjustable axicon;
- a variable zoom element;
- and
- a lens array comprising a plurality of lens segments arranged substantially in a plane,
- wherein said plurality of lens segments includes a first lens segment and a second lens segment effectively from a single lens, said first and second lens segments being at least one of displaced or rotated with respect to each other in said planar arrangement of lens segments compared to corresponding positions in said single lens, and
- wherein said lens array is adapted to redirect light into a multipole illumination pattern.
8 more elements
A device manufacturing method, comprising:
- producing a beam of illumination radiation;
- illuminating at least one array of lens segments with said beam of illumination radiation to provide a multipole illumination beam having a multipole intensity distribution along a cross-section thereof;
- illuminating a mask with at least a portion of said multipole illumination beam, wherein said illuminating said mask produces a pattern of radiation radiating from said mask;
- and
- projecting at least a portion of said pattern of radiation radiating from said mask onto a substrate,
- wherein said at least one array comprises a plurality of lens segments arranged substantially in a plane, and
- wherein said plurality of lens segments includes a first lens segment and a second lens segment effectively from a single lens, said first and second lens segments being at least one of displaced or rotated with respect to each other in said planar arrangement of lens segments compared to corresponding positions in said single lens.
4 more elements
An illumination system for a lithographic apparatus, comprising:
- an adjustable axicon;
- a variable zoom element disposed in an optical path of said adjustable axicon;
- and
- a lens array disposed in an optical path of said adjustable axicon and said variable zoom element,
- wherein said lens array comprises a plurality of lens segments arranged substantially in a plane,
- wherein said plurality of lens segments includes a first lens segment and a second lens segment effectively from a single lens, said first and second lens segments being at least one of displaced or rotated with respect to each other in said planar arrangement of lens segments compared to corresponding positions in said single lens, and
- wherein said lens array is adapted to redirect light into a multipole illumination pattern.
4 more elements
An illumination system for a lithographic apparatus, comprising:
- an adjustable axicon;
- a variable zoom element disposed in an optical path of said adjustable axicon;
- and
- a diffractive optical element disposed in an optical path of said adjustable axicon and said variable zoom element,
- wherein said illumination system forms a multipole illumination beam from an input beam of radiation, and
- wherein said diffractive optical element is an array of lens segments, comprising:
- a lens array comprising a plurality of lens segments arranged substantially in a plane,
- wherein said plurality of lens segments includes a first lens segment and a second lens segment effectively from a single lens, said first and second lens segments being at least one of displaced or rotated with respect to each other in said planar arrangement of lens segments compared to corresponding positions in said single lens, and
- wherein said lens array is adapted to redirect light into a multipole illumination pattern.
6 more elements
A lithographic apparatus, comprising:
- a radiation system adapted to supply a beam of radiation;
- a mask table arranged in a path of radiation from said beam of radiation;
- a substrate table arranged in a path of radiation from said beam of radiation after passing said mask table;
- a projection system arranged in a path of radiation from said beam of radiation and between said mask table and said substrate table, said projection system being adapted to image an irradiated portion of a mask held by said mask table onto a target portion of a substrate held by said substrate table,
- wherein said radiation system comprises an illumination system, said illumination system comprising:
- an adjustable axicon;
- a variable zoom element disposed in an optical path of said adjustable axicon;
- and
- a lens array comprising a plurality of lens segments arranged substantially in a plane,
- wherein said plurality of lens segments includes a first lens segment and a second lens segment effectively from a single lens, said first and second lens segments being at least one of displaced or rotated with respect to each other in said planar arrangement of lens segments compared to corresponding positions in said single lens, and
- wherein said lens array is adapted to redirect light into a multipole illumination pattern.
8 more elements
A lithographic apparatus, comprising:
- a radiation system adapted to supply a beam of radiation;
- a mask table arranged in a path of radiation from said beam of radiation;
- a substrate table arranged in a path of radiation from said beam of radiation after passing said mask table;
- a projection system arranged in a path of radiation from said beam of radiation and between said mask table and said substrate table, said projection system being adapted to image an irradiated portion of a mask held by said mask table onto a target portion of a substrate held by said substrate table,
- wherein said radiation system comprises an illumination system, said illumination system comprising:
- an adjustable axicon;
- a variable zoom element disposed in an optical path of said adjustable axicon;
- and
- a diffractive optical element disposed in an optical path of said adjustable axicon and said variable zoom element,
- wherein said diffractive optical element comprises a plurality of lens segments arranged substantially in a plane, and
- wherein said plurality of lens segments includes a first lens segment and a second lens segment effectively from a single lens, said first and second lens segments being at least one of displaced or rotated with respect to each other in said planar arrangement of lens segments compared to corresponding positions in said single lens, and
- wherein said illumination system forms a multipole illumination beam from said beam of radiation.
9 more elements
Dependencies are inferred from the claim text.