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US 11,378,887 B2Granted
Pupil facet mirror, illumination optics and optical system for a projection lithography system
AssigneeCarl Zeiss SMT GmbH
InventorMarkus Deguenther
Life of this patent
Estimating the term…
Abstract
In an optical system for a projection exposure apparatus, the angle space of the illumination radiation of the projection optical unit at the reticle is twice as large in a first direction as the angle space of the illuminating radiation of the illuminating optical unit.
Claims20
An optical system, comprising:
- an illumination optical unit configured to transfer illumination radiation to a reticle;
- and
- a projection optical unit configured to project structures of the reticle onto a light-sensitive material,
- wherein:
- the illumination radiation that is reflected at the reticle comprises a +1 order of diffraction and a −1 order of diffraction;
- and
- the illumination optical unit and the projection optical unit are configured so that, for the illumination radiation that is reflected at the reticle, only one of the following holds:
- only a portion of the +1 order of diffraction is contained in the beam of the projection optical unit and none of the −1 order of diffraction is contained in the beam of the projection optical unit;
- and
- only a portion of the −1 order of diffraction is contained in the beam of the projection optical unit and none of the +1 order of diffraction is contained in the beam of the projection optical unit.
7 more elements
Dependencies are inferred from the claim text.