Optical system for transferring original structure portions of a lithography mask, projection optical unit for imaging an object field in which at least one original structure portion of the lithography mask is arrangeable, and lithography mask

Optical system for transferring original structure portions of a lithography mask comprising a plurality of the original structure portions to be imaged and separating portions,

• wherein the original structure portions are arranged in a line next to one another and are separated from one another by the separating portions, which do not carry any structures to be imaged,
• wherein the original structure portions have a first extent in a first dimension (x) and a second extent in a second dimension (y) that extends perpendicularly to the first dimension (x), wherein an aspect ratio (x/y) of the first and the second extents is greater than 4:1,
• wherein a transfer onto image portions of a substrate with a diameter (d) comprises imaging an object field, in which at least one of the original structure portions of the lithography mask is arrangeable, into an image field, in which at least one of the image portions of the substrate is arrangeable, and
• wherein the optical system is embodied such that
• an image of each of the original structure portions is transferred to a separate image portion and wherein the image portions onto which the images of the original structure portions are transferred are arranged in a line next to one another,
• a totality of the original structure portions on the lithography mask produce a totality of the image portions during the transfer, wherein the totality of the image portions have an overall length (Dy) in one direction (y) that is greater than half (d/2) the diameter (d) of the substrate.